Lam Research

The Lam Research TCP 9400 ICP is an inductively coupled plasma etcher from Lam Research.

Lam Research A 6 Exelan HPT is a dielectric etch tool configured for 8-inch wafers and identified with Exelan HPT chambers.

The Lam Research 2300 Exelan Flex is an etch tool, with sources describing it as an etch chamber or etcher.

Lam Research's SPEED product family is a series of High-Density Plasma Chemical Vapor Deposition (HDP-CVD) systems used for dielectric gapfill in semiconductor manufacturing.

The Lam / Novellus Concept Speed is an 8-inch chamber manufactured by Lam Research (also branded Novellus).

The Lam / SEZ DV 34 is a wafer processing tool that supports 8-inch and 12-inch wafer sizes.

The Lam / Novellus / Gasonics Triple Speed NF is a chemical vapor deposition (CVD) system with three HDP chambers, a Brooks robot, SLM type, three ports, and loadlock helium reduction.

The SEZ 203 Spin Processor is an 8-inch spin etcher.

The Lam Research TCP 9600 SE is a transformer-coupled plasma (TCP) etch system for metal layer etching, capable of processing 6-inch and 8-inch wafers.

The Lam / Novellus / Gasonics L 3510 is a plasma asher.

The Lam Research 590 is a plasma etcher.

The Lam Alliance A 6 Exelan HPT is a dielectric etch system for 8-inch wafers, equipped with Exelan HPT chambers and a 4520 chamber.

The SEZ SP 323 is a single-wafer wet chemical processor used for spin etching in semiconductor manufacturing.

The Lam Research TCP 9600 is a dry etch system for metal etching, designed for 200 mm wafers.

The Lam P/N: 853-032776-605 DSQ Paddle Lifter Assembly is a refurbished semiconductor equipment component.

The Lam/SEZ 201 Backside Etcher is a backside etching tool for 8-inch wafers.

The Lam/Novellus/Gasonics PEP 3510 Plus is a semiconductor processing tool that handles 8-inch wafers and includes a 2 kW microwave generator.

The Lam Research TCP 9400 SE is an inductively coupled plasma etch system used for polysilicon/polycide etch and shallow trench isolation.

The Lam Research 2300 Versys Kiyo Polysilicon Etch is a 300mm wafer plasma etch system designed for polysilicon etching.

The Lam VEXP is a chemical vapor deposition (CVD) system manufactured by Lam Research.

Lam Research Vector is a PECVD deposition platform for dielectric film deposition.

The Lam 2300 e 5 Kiyo is a three-chamber plus one-strip etch system.

The Lam 2300 V 2 Versys Kiyo 45 is a 12-inch polysilicon etch system.

Lam Research SEZ SP 304 is a single-wafer processing wet cleaning tool stated to handle 8-inch wafers.

The Lam/SEZ SP 304 is a single wafer processing system supporting 12-inch wafers.

The Lam 2300 e 5 Exelan Flex FX is a dielectric etch system for 12-inch wafers.

The Gasonics L3510 is a downstream photoresist removal system utilizing a patented microwave plasma source for clean, low-damage removal of photoresist, polymers, and process residues.

The Lam Research TCP 9400 is a Transformer Coupled Plasma (TCP) etcher for selective etching of silicon and polysilicon.

The Lam / IPEC AvantGaard 776 Tungsten is an 8-inch tungsten CMP (chemical mechanical polisher).

The Lam Research 2300 V 2 Kiyo 45 is an etcher used in semiconductor manufacturing, with some units configured for polysilicon etching and using an Edwards STP XA2703CV pump.

The Lam Research IPEC 372 M is a chemical mechanical polisher (CMP) for 8-inch (200 mm) wafers, also known as the IPEC 372M Avanti automated wafer polishing system.

The Lam / Novellus / Gasonics Gamma 2130 is a photoresist stripper with source-described system and process chamber configurations.

The Lam / SEZ 203 is a spin processor used for wet etching and backside cleaning of 200mm wafers.

The Lam Research 2080 TCU is a dual-channel temperature control unit (chiller) for heating and cooling of upper and lower electrodes in Lam systems.

The Lam / Novellus Concept One is a chemical vapor deposition (CVD) system used for depositing thin films on semiconductor wafers.

The Lam Research (Novellus) Concept Two Dual Sequel is a chemical vapor deposition (CVD) system.

The Lam Research 2300 Exelan is a dielectric etch system for 300mm wafers, validated for sub-65-nm front- and backend applications.

The Lam / SEZ RST 201 Spin is a spin etcher designed for 6-inch wafers, with a reported vintage of 1997.

The Lam Research Rainbow 4720 is a semiconductor etch tool that supports 8-inch (200mm) wafers.

The Lam Research 2300 e 4 Kiyo MCX Metal is a semiconductor etch tool used for metal etching.

The Lam Research AutoEtch 494 is an etch tool for semiconductor manufacturing.

The Gasonics Speed is a chemical vapor deposition (CVD) system manufactured by Lam Research, Novellus, and Gasonics.

The Lam Flex Expl Dry is a Lam Research etch tool.

The Lam ALT is a Chemical Vapor Deposition (CVD) tool.

The Lam Research Rainbow 4420 Multi-Process is an etch tool.

The Lam Alliance A 6 TCP 9400 DFM is an 8-inch polysilicon etch system from Lam Research.

The Lam Research Gasonics PEP 4800 DL is an etcher.

The Lam 2300 e 4 Exelan GX is an etcher used in semiconductor manufacturing.

The Lam SEZ203 is a Spinprocessor Typ 10 used for wet processing of semiconductor wafers.

The Lam Rainbow 4528B SN2800 is a plasma etch system from Lam Research designed for 8-inch wafers.

The Lam Research E 4 Kiyo is an etch process chamber.