Lam Research
Concept One
The Lam / Novellus Concept One is a chemical vapor deposition (CVD) system. The Concept One handles wafer sizes of 6 inches and 8 inches. The Concept One is designed for nitride and TEOS deposition processes.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedChemical vapor deposition systems introduce precursor gases into a heated reactor chamber. Thermal energy drives a chemical reaction that deposits a solid film onto the substrate surface. The system precisely controls gas flow, temperature, and pressure to produce uniform layers.
Applications
General reference — not yet source-verifiedSilicon nitride films serve as protective coatings, diffusion barriers, or dielectric layers in integrated circuits. Silicon dioxide films derived from TEOS are used as electrical insulators and optical coatings.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Missing PC
- Missing remote A/C Box
What do the numbers mean?
Power & electrical8
Vacuum & pumping1
- Does not include Dry Pumps[8]
Wafer handling5
Gas & chemistry1
Control & software3
Configuration & options16
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 6 inch version | — | — | Listed with 6-inch wafer size; one listing includes Nitride / TEOS and 3 Phase, 50/60 Hz, 208V Vac. | Equipment inventory listing[1] |
| 8 inch version | — | 2012 | Listed with 8-inch wafer size and 2012 vintage; one listing includes Nitride / TEOS and 208V, 50/60 Hz, 3 Phase. | Equipment inventory listing[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Parts & consumables
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
- Lam / Novellus Concept One ModulesIn Productionsource[9]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Concept One are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Concept One are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Concept One are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Concept One is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly hosted manuals, SOPs, or datasheets for the Concept One are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (10)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]inventory listing
- [7]inventory listing
- [8]inventory listing
- [9]Equipment inventory listing
- [10]Equipment inventory listing
Last updated Oct 11, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.