Tokyo Electron
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron CLEAN TRACK Lithius i+ is a coater/developer system used in semiconductor lithography. The CLEAN TRACK Lithius i+ is built as a 300 mm wafer version. The CLEAN TRACK Lithius i+ functions as a photoresist coater and developer track, and a CLEAN TRACK Lithius i+ was used to spin-coat SOC and SOG underlayer films in a nanoimprint lithography process.[1][2][3]
The Tokyo Electron Lithius i+ is a photoresist coater and developer track system. The machine is also referred to as a coater/developer. The Lithius i+ is part of the Tokyo Electron CLEAN TRACK series.[4][1][2][3]
The Lithius i+ is a high-reliability and productivity coater developer with a 5C/5D configuration. The system supports 300 mm (12 inch) wafer processing.[4][2]
The Lithius i+ can also spin-coat spin-on-carbon (SOC) and spin-on-glass (SOG) layers. The coater/developer is used in a nanoimprint lithography process flow to apply transfer layers before imprinting.[1]
In the nanoimprint lithography process, the Lithius i+ is used to spin-coat the transfer layers (SOC and SOG) onto the substrate before the imprint step. The system then handles the post-imprint developing of the residual layer.[1]
The Lithius i+ is used in nanoimprint lithography processes for spin-coating spin-on-carbon and spin-on-glass materials. The coater/developer is also employed in the fabrication of W-damascene interconnect patterns.[1]
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The Lithius i+ is part of the Tokyo Electron CLEAN TRACK series of coater/developer systems.[1]
The following facts about the Lithius i+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Lithius i+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Lithius i+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Lithius i+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Lithius i+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Lithius i+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Sep 25, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.