Tokyo Electron

The Tokyo Electron A 8 S ZA is a PoCl3 furnace with an EPROM based control system.

The Tokyo Electron Unity II E 855 SS is an etcher for 8-inch wafers.

The Tokyo Electron Lithius G 260616 is a semiconductor manufacturing tool designed for 12-inch (300mm) wafers.

The Tokyo Electron Clean Track Mark 7 is a coater/developer platform for semiconductor wafers, also used as the basis for the SS-series stand-alone scrubber system.

The Tokyo Electron Vigus RK 3 is a semiconductor equipment model that handles 12-inch wafers.

TEL Unity Me is an automatic plasma etching production tool from Tokyo Electron, configured at CMi with a 100mm wafer cassette loader, a transfer chamber, and a DRM process module.

The Tel Unity II E 85 DD is an 8-inch oxide etch system.

The Tokyo Electron Trias Metal is a semiconductor processing system that supports metal chemical vapor deposition (CVD) for Ti/TiN and metal etching, and handles 300 mm (12-inch) wafers.

The TEL Trias is a plasma nitridation deposition system handling 8-inch and 12-inch wafers.

The Tokyo Electron Tactras RLSA Process is an etch process chamber for 12-inch wafers used for poly etch.

The Tokyo Electron Alpha 6 S is a batch processing deposition system introduced in 2000, with a variant configured for low-pressure silicon nitride CVD on 8-inch wafers.

The Tokyo Electron Alpha 8 S is a vertical furnace for 8-inch wafers, configured for ATM Oxide processes.

The Tokyo Electron CLEAN TRACK Lithius i+ is a 300 mm coater/developer track used for photoresist coating and developing and for spin-coating underlayer films in lithography processes.

The Tokyo Electron Alpha 8 SE Z is an oxidation furnace configured for 8-inch wafers.

Tokyo Electron Clean Track Mark 5 coater described as a single coater with 3 pump dispensers, 2 hot plates, 2 cold plates, and one unknown station.

Tokyo Electron 8 SE is a high-temperature oxide tool for 8-inch wafers.

The Tokyo Electron WDF DP is a wafer prober.

The Tel P 8 XL Automatic Wafer Prober is an automatic wafer prober manufactured by Tel.

The Tel VIGSRK Dry Etcher is a dry etching system.

The P 8 XLm is a wafer prober manufactured by Tokyo Electron.

The Tokyo Electron Alpha 303 i K is a 12-inch-wafer furnace in the Thermal / Diffusion category, documented in MTO and DCS-MTO configurations.

Tokyo Electron NS300Z is a scrubber system for 300mm wafers, featuring process modules with proven reliability and stability, and offering further productivity improvements.

The Tokyo Electron Alpha 303 i H MTO is a 12-inch wafer processing tool from 2001.

General referenceTokyo Electron P 12 XLn is a test and probe system. Machines of this class are used to contact semiconductor devices or wafers and collect electrical measurements for inspection and characterization.

Tokyo Electron Formula is a furnace with source-listed 12-inch wafer size and applications including TEOS, HF, F2, DCS, NH3, and SiN.

The Tokyo Electron TACVESNV is a dry etcher used in semiconductor manufacturing.

The Tokyo Electron Formula Diffusion is a diffusion furnace for thermal processing, with a variant supporting 300 mm wafers and an aluminium oxide process.

The Tokyo Electron Precio 12 XLm is a wafer prober classified as a Test & Probe tool.

Tokyo Electron LIPRZ 2 G is a semiconductor equipment model identified by make Tel and model LIPRZ 2 G.

The Telius SP Vesta is a dry etcher for 12-inch wafers manufactured by Tokyo Electron (TEL).

The Telius DRM is a plasma etcher manufactured by Tokyo Electron for 12-inch wafer processing.

The TEL Tokyo Electron Telius is a dry etcher for 300 mm wafers.

The Tokyo Electron Unity II E 855 DD Dry is a dry etcher.

The Tel VDF 615 S is a furnace that processes 6-inch wafers.

The Tokyo Electron TE 8401 is a dry etcher for 8-inch wafers, available in single-chamber poly etch and dual-chamber nitride etch configurations.

The Tokyo Electron Trais is an etch tool used in semiconductor manufacturing.

The Precio series is a fully automatic wafer-probing platform from Tokyo Electron Limited.

The Expedius I Batch Cleaner is a batch cleaning system for 12-inch (300mm) wafers.

Tokyo Electron TSP 305 SCCM SE+ Oxide is an oxide etch system for 12-inch wafer processing.

The Tokyo Electron TRA is a deposition tool categorized as a CVD (Chemical Vapor Deposition) system.

The Tokyo Electron Unity EP is a 200mm chemical vapor deposition (CVD) tool configured with TiN chambers.

The Tokyo Electron P 12 XLn+ is an automatic wafer prober.

The Tokyo Electron A 8 is a batch thermal processing system manufactured in 1998.

The Tokyo Electron Unity ME 8555 DDD is a dielectric etch system for 8-inch wafers.

The Tokyo Electron Mark 8 is a photoresist coating and developing track system used in semiconductor lithography.