SUSS MicroTec
MA 200 Compact Mask
Plate 01Suss MA200 Compact Mask Aligner (2015 vintage) - Demonstration
Lithography Equipment SupportWatch on YouTubePlate 02Karl Suss MA200 2
What it is
General reference — not yet source-verifiedThe SUSS MicroTec MA 200 Compact Mask Aligner is a mask aligner for photolithography. It is a compact wafer-processing tool used with a mask and includes wafer handling and alignment functions.
How it works
The described unit includes a robot-type wafer handler, two loaders, a pre-aligner, vacuum, nitrogen gas, and GEM or SECS connectivity. It is specified for three-phase power at 400 V and 50/60 Hz with a listed input of 2800 VA.[1]
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment is used in the lithography portion of a semiconductor or microfabrication flow, after a wafer has been prepared with a photosensitive film and before that pattern is transferred into underlying layers by later processing steps.
Applications
General reference — not yet source-verifiedMask aligners are used for photolithographic patterning in microfabrication, especially where precise alignment between a mask and a wafer is required for exposing device features.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- CIC power supply missing
What do the numbers mean?
Power & electrical5
Vacuum & pumping1
- Vacuum[1]
Wafer handling3
- 2 Loaders[1]
Gas & chemistry1
Dimensions & facilities1
- CDA[1]
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What vintage is given for this unit?
The listed vintage is 2006.[1]
Not publicly documented
The following facts about the MA 200 Compact Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 Compact Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 Compact Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 Compact Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the MA 200 Compact Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 200 Compact Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
Last updated Jul 29, 2026.
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