Nikon
The Nikon NSR-1505G4 is a wafer stepper for photolithography. The Nikon NSR-1505G4 uses g-line UV light with a 5x reduction. The Nikon NSR-1505G4 provides better than 750 nm resolution and better than 150 nm alignment.[1][2]

Wafer size
4"
Node / era
better than 750 nm resolution; better than 150 nm alignment
Optics
5" reticle[1]
A wafer stepper belongs in the photolithography portion of a semiconductor process flow.
The Nikon NSR-1505G4 is used to transfer patterned features onto wafers after resist coating and before later pattern-transfer steps such as etching or lift-off.
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The following facts about the NSR-1505G4 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR-1505G4 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR-1505G4 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR-1505G4 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR-1505G4 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the NSR-1505G4 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 7, 2026.
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