Waferpedia

Axcelis

NV GSD HE

Ion Implantation8"Axcelis NV GSD HE family
Research Quality: 50% complete

The Axcelis NV GSD HE is an ion implantation system. The Axcelis NV GSD HE can handle 6-inch wafers and can be converted to handle 8-inch wafers. The Axcelis NV GSD HE configuration includes an end station, disk module, final energy magnet, linac module, gas box, and source.[1][2][3]

NV GSD HE — Inventory photo
Fig. 01NV GSD HEInventory photo[1]

Wafer size

8"

Power

High voltage power supply[1]

Vacuum

Both front and rear Cyro pumps by the OEM[1]

Gas delivery

All gas box elements[1]

What it is

The Axcelis NV GSD HE is an ion implantation system.[2]

How it works

The NV GSD HE includes a high-voltage power supply, terminal power supplies, gas box elements, vacuum pumps, valves, resonant cavities, and ion sources.[1][2]

Where it fits in the process flow

The NV GSD HE fits into the wafer-handling and beamline portion of the implantation flow, with chamber, beamline, gas delivery, vacuum, and power subsystems supporting implantation.[1][2][3]

Applications

General reference — not yet source-verified

Ion implantation is used to introduce controlled dopant species into semiconductor wafers.

The NV GSD HE is a mature-node wafer implantation tool class suited to semiconductor device fabrication on silicon wafers.

What do the numbers mean?

Power & electrical8

Complete refurbishment of resonant cavities (LINACs, resonator DI boards and RF power supplies)[1]
Accurate?
High voltage power supply[1]
Accurate?
Terminal power supplies (filament, bias, arc, magnet, source magnet)[1]
Accurate?
Refurbishment
Complete refurbishment of resonant cavities (LINACs, resonator DI boards and RF power supplies)[1]
Accurate?
Replacement
High voltage power supply[1]
Accurate?
Replacement
Terminal power supplies (filament, bias, arc, magnet, source magnet)[1]
Accurate?
Power supply
High voltage power supply[1]
Accurate?
Terminal power supplies
Filament, bias, arc, magnet, source magnet[1]
Accurate?

Vacuum & pumping10

Both front and rear Cyro pumps by the OEM[1]
Accurate?
Valves, gate valves, and vacuum valves[1]
Accurate?
Mechanical and booster pumps[1]
Accurate?
A low pressure H2 upgrade was performed:[1]
Accurate?
Replacement
Both front and rear Cyro pumps by the OEM[1]
Accurate?
Replacement
Valves, gate valves, and vacuum valves[1]
Accurate?
Replacement
Mechanical and booster pumps[1]
Accurate?
Upgrade
A low pressure H2 upgrade was performed[1]
Accurate?
Upgrade
Beam performances similar to H2 pressure technology[1]
Accurate?
Vacuum pumps
Both front and rear Cryo pumps by the OEM[1]
Accurate?

Wafer handling3

Wafer size
Wafer can be converted back to 8"[1]
Accurate?
Wafer size
6 inch / 8 inch (convertible)[2]
Accurate?
Wafer size
8"[2]2 sources
Accurate?

Gas & chemistry6

All gas box elements[1]
Accurate?
No gas stock management[1]
Accurate?
Replacement
All gas box elements[1]
Accurate?
Upgrade
No gas stock management[1]
Accurate?
System configuration
End station, disk module, final energy magnet, linac module, gas box, source[2]
Accurate?
Gas delivery
All gas box elements[1]
Accurate?

Configuration & options25

Refurbished[1]
Accurate?
Refurbishment of isolation transformer[1]
Accurate?
All assembly refurbished and fitted with new consumables[1]
Accurate?
Chamber and beamline CO2 cleaned and diamond polished to return to as-new condition[1]
Accurate?
Two new SAC IHC ion sources[1]
Accurate?
System tested to original equipment manufacturers specification[1]
Accurate?
Replacement of:[1]
Accurate?
All water lines and fittings[1]
Accurate?
Pneumatic lines where required (inspected)[1]
Accurate?
High level of safety
No stored H2, but on demand instant generation[1]
Accurate?
Serial number
090084[3]
Accurate?
Manufacturing year
2000[3]
Accurate?
1 Chamber, 1 Load Port[3]
Accurate?
Refurbishment
Refurbished[1]
Accurate?
Refurbishment
Refurbishment of isolation transformer[1]
Accurate?
Refurbishment
All assembly refurbished and fitted with new consumables[1]
Accurate?
Refurbishment
Chamber and beamline CO2 cleaned and diamond polished[1]
Accurate?
Refurbishment
Two new SAC IHC ion sources[1]
Accurate?
Refurbishment
System tested to original equipment manufacturers specification[1]
Accurate?
Replacement
All water lines and fittings[1]
Accurate?
Replacement
Pneumatic lines where required (inspected)[1]
Accurate?
Upgrade
No stored H2, but on demand instant generation[1]
Accurate?
Upgrade
Fully CE compliant[1]
Accurate?
Ion source
Two new SAC IHC ion sources[1]
Accurate?
Chamber configuration
1 Chamber, 1 Load Port[3]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationComplete refurbishment of resonant cavities (LINACs, resonator DI boards and RF power supplies)[1]
  • ConfigurationBoth front and rear Cyro pumps by the OEM[1]
  • ConfigurationValves, gate valves, and vacuum valves[1]
  • ConfigurationMechanical and booster pumps[1]
  • ConfigurationHigh voltage power supply[1]
  • ConfigurationTerminal power supplies (filament, bias, arc, magnet, source magnet)[1]
  • ConfigurationAll gas box elements[1]
  • ConfigurationA low pressure H2 upgrade was performed:[1]
  • ConfigurationNo gas stock management[1]
  • RefurbishmentComplete refurbishment of resonant cavities (LINACs, resonator DI boards and RF power supplies)[1]
  • ReplacementBoth front and rear Cyro pumps by the OEM[1]
  • ReplacementValves, gate valves, and vacuum valves[1]
  • ReplacementMechanical and booster pumps[1]
  • ReplacementHigh voltage power supply[1]
  • ReplacementTerminal power supplies (filament, bias, arc, magnet, source magnet)[1]
  • ReplacementAll gas box elements[1]
  • UpgradeA low pressure H2 upgrade was performed[1]
  • UpgradeNo gas stock management[1]
  • UpgradeBeam performances similar to H2 pressure technology[1]
  • System configurationEnd station, disk module, final energy magnet, linac module, gas box, source[2]
  • Power supplyHigh voltage power supply[1]
  • Terminal power suppliesFilament, bias, arc, magnet, source magnet[1]
  • Vacuum pumpsBoth front and rear Cryo pumps by the OEM[1]
  • Gas deliveryAll gas box elements[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What wafer sizes can the NV GSD HE handle?

The NV GSD HE can handle 6-inch wafers and can be converted to handle 8-inch wafers.[1][2]

What are the main components of the NV GSD HE?

The configuration of the NV GSD HE includes an end station, disk module, final energy magnet, linac module, gas box, and source.[2][3]

What power supply components does the NV GSD HE include?

The NV GSD HE includes a high-voltage power supply and terminal power supplies for filament, bias, arc, magnet, and source magnet.[1][2]

What vacuum components are part of the NV GSD HE?

The NV GSD HE includes both front and rear cryogenic pumps by the OEM, as well as valves, gate valves, mechanical pumps, and booster pumps.[1][2]

Not publicly documented

The following facts about the NV GSD HE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV GSD HE are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the NV GSD HE are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the NV GSD HE are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NV GSD HE are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the NV GSD HE is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]limitekltd.com — limitekltd.comlimitekltd.com
  4. [4]Inventory photo
Was this page accurate?

Last updated Oct 3, 2026.

Compare with similar tools

View all →