Waferpedia

ASML

5500/80

The ASML 5500/80 is an i-line wafer stepper. The ASML 5500/80 is set up for 4-inch wafers. The ASML 5500/80 is convertible to 3-inch or 6-inch platforms.[1][2]

5500/80 — nanofab.ece.cmu.edu
Fig. 015500/80nanofab.ece.cmu.edu[1]

Wafer size

4-inch wafers; convertible to 3-inch or 6-inch platforms

Node / era

500nm resolution

Performance

<70nm[1]

Optics

500nm[1]

What it is

General reference — not yet source-verified

The ASML 5500/80 is an i-line wafer stepper used for photolithography on wafers.

How it works

General reference — not yet source-verified

A wafer stepper projects a patterned image from a mask onto photoresist-coated wafers through a reduction optical system. The tool exposes one field at a time and then advances the wafer to the next field for repeated pattern transfer.

Where it fits in the process flow

General reference — not yet source-verified

The ASML 5500/80 sits in the photolithography portion of wafer fabrication. The tool is used after resist coating and alignment and before the developed pattern is transferred into underlying films by later process steps.

What do the numbers mean?

Wafer handling2

Wafer setup
Set up for 4-inch wafers[1]
Accurate?
Wafer size
4-inch wafers; convertible to 3-inch or 6-inch platforms[1]
Accurate?

Optics & imaging1

Resolution
500nm[1]
Accurate?

Performance1

Alignment accuracy
<70nm[1]
Accurate?

Dimensions & facilities1

Depth of focus
1.3µm[1]
Accurate?

Configuration & options4

Convertible platforms
3-inch or 6-inch platforms[1]
Accurate?
Field size
21mm x 21mm[1]
Accurate?
Category
Lithography[2]
Accurate?
Generation
i-line[3]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the ASML 5500/80 support?

The ASML 5500/80 is set up for four-inch wafers and is convertible to three-inch or six-inch platforms.[1][2][3]

Not publicly documented

The following facts about the 5500/80 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500/80 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 5500/80 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 5500/80 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 5500/80 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • No publicly documented compatible parts, consumables, or accessories for the 5500/80 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
  4. [4]Equipment - Claire & John Bertucci Nanotechnology Laboratory - College of Engineering - Carnegie Mellon University — nanofab.ece.cmu.edunanofab.ece.cmu.edu
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Last updated Oct 5, 2026.

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