Manufacturer
Ulvac
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62 entries
- UNECS-2000Ulvac
The ULVAC UNECS-2000 is a spectroscopic ellipsometer used to measure refractive index and thin-film thickness.
CategoryMeasurement - PRC 012 AS DryUlvacCategoryLab & Support Equipment
- SRH 420 MC BacksideUlvacCategoryDeposition
- NE 5500Ulvac
The Ulvac NE 5500 is an etch tool used in semiconductor manufacturing.
CategoryEtch - CME 200 JUlvac
The Ulvac CME 200 J is a plasma-enhanced chemical vapor deposition (PECVD) system.
CategoryDeposition - Ei 7 K VacuumUlvacCategoryDeposition
- EBX 2000 High Vacuum EvaporationUlvac
The Ulvac EBX 2000 is a high vacuum evaporation system manufactured by Ulvac, with a reported vintage of 2005.
CategoryDeposition - EBX 10 C High Vacuum EvaporationUlvacCategoryDeposition
- SRH 420Ulvac
- 711 w 1 Leak detectorUlvac
- SIV 200Ulvac
- EX 550 C 12 VaporUlvac
The Ulvac EX 550 C 12 Vapor is a vapor deposition system that accepts 6-inch wafers.
CategoryDeposition - SRH 530UlvacCategoryDeposition
- PDR 090 B DryUlvac
The Ulvac PDR 090 B is a dry pump.
- SIV 200 ITOUlvac
The Ulvac SIV 200 ITO is a sputtering system.
CategoryDeposition - Enviro IIUlvac
- EBX 1000 C VaporUlvac
The Ulvac EBX 1000 C is a vapor deposition tool for 6-inch wafers.
CategoryDeposition - SME 200 JUlvac
The Ulvac SME 200 J is a sputtering system.
CategoryDeposition - SIV 500 ITOUlvac
The Ulvac SIV 500 ITO is a sputtering system.
CategoryDeposition - EX 550 C 10 VaporUlvacCategoryDeposition
- NE 550 EX DryUlvac
The Ulvac NE 550 EX is a dry etcher that handles 4 inch wafers.
CategoryEtch - CRYO U 8 HL CryopumpUlvac
The Ulvac CRYO U 8 HL is a cryopump with a 9.5-inch outer diameter and an 8.375-inch inner diameter ISO flange.
- CV 200Ulvac
The Ulvac CV 200 is a physical vapor deposition (PVD) sputter system.
CategoryDeposition - NE 700 DryUlvac
The Ulvac NE 700 Dry is a dry etcher manufactured by Ulvac and categorized as an Etch tool.
CategoryEtch - Heliot 700 Helium Leak DetectorUlvac
The Ulvac Heliot 700 Helium Leak Detector is a helium leak detector manufactured by ULVAC of Japan.
- SOPHI 200Ulvac
The Ulvac SOPHI 200 Ion is an ion implantation tool family entry with one documented model, SOPHI 200 Ion.
- EBX 8 CUlvacCategoryDeposition
- U 12 CryopumpUlvac
The Ulvac U 12 Cryopump is a cryopump identified by model U 12.
- Enviro Advanced StripUlvac
The Ulvac Enviro Advanced Strip is an equipment model from Ulvac for which no technical specifications are publicly documented.
- SME 200 Pt PlatinumUlvac
The Ulvac SME 200 Pt Platinum is a sputter deposition system.
CategoryDeposition - U 22 CryopumpUlvac
The Ulvac U 22 is a cryopump.
- U 9 CryopumpUlvac
The Ulvac U 9 Cryopump is a cryopump manufactured by Ulvac.
- LR 3600 DryUlvac
The Ulvac LR 3600 Dry is a dry pump manufactured by Ulvac.
- Entron EXUlvacCategoryDeposition
- Ceraus ZX 1000Ulvac
The Ulvac Ceraus ZX 1000 is a PVD (Physical Vapor Deposition) system that handles 8 inch wafers.
CategoryDeposition - 1200 IISUlvac
The Ulvac 1200 IIS is a semiconductor manufacturing tool by Ulvac, documented in equipment inventory listings.
- NE 950 EX ICPUlvac
The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.
CategoryEtchWaferWafer end effector - Phi Adept 1010 Automated Depth ProfilingUlvac
- SME 200Ulvac
The Ulvac SME 200 is a sputtering system used for thin film deposition.
CategoryDeposition - Enviro Downstream MicrowaveUlvac
The Ulvac Enviro Downstream Microwave Asher is a single-chamber advanced strip system with an ENI OEM-6B RF generator, five MFCs, a Brooks robot, and an Edwards IQ pump/blower.
- Ei 7 L E-BeamUlvac
The Ulvac Ei 7 L is an e-beam evaporator with an auto loader, wafer transfer system, load lock chamber, process chamber, and operation panel, designed for depositing metals such as Al, Ni, Ti, Pt, and Au.
CategoryDepositionWaferAuto loader (EFEM), wafer transfer system, load lock chamber, process chamber, operation panel. - SIV 500Ulvac
The Ulvac SIV 500 is an in-line sputtering system used for thin-film deposition, including indium tin oxide (ITO).
CategoryDeposition - Ceraus Z 1101Ulvac
The Ulvac Ceraus Z 1101 is a physical vapor deposition (PVD) system that processes 6 inch wafers.
CategoryDeposition - NE 950Ulvac
The Ulvac NE 950 is an ICP-RIE etch system with a chamber described for 2" to 12" wafers.
CategoryEtch - C 30 B Cryo CompressorUlvac
- SMD 450Ulvac
The Ulvac SMD 450 is a sputtering system in the deposition category.
CategoryDeposition - RFS 2780Ulvac
The Ulvac RFS 2780 is an RF generator.
- NE 950 EXUlvacCategoryEtch
- Entron EX W 300Ulvac
The Ulvac Entron EX W 300 is a PVD (Physical Vapor Deposition) system manufactured by Ulvac.
CategoryDeposition - NE 5700Ulvac
The Ulvac NE 5700 is a dry etching system for production use, configured as a 200mm cluster tool with up to two process chambers.
CategoryEtchWaferWafer Equipment - IPZ 9001UlvacCategoryIon Implantation
- CRYO U 10 HL CryopumpUlvac
- Ei 5 AuUlvacCategoryDeposition
- Heliot 701 Helium Leak DetectorUlvac
The Ulvac Heliot 701 is a helium leak detector.
- EBX 1000 High Vacuum EvaporationUlvac
The Ulvac EBX 1000 is a high vacuum evaporation system.
CategoryDeposition - NE 5000 NUlvac
The Ulvac NE 5000 N is an etcher described with 6-inch wafer size, helium cooling, auto loading and unloading, and uniformity of +/- 3%.
CategoryEtch - SOPHI 200 IonUlvacCategoryIon Implantation
- Ei 5UlvacCategoryDeposition
- G 50 D Rotary VacuumUlvac
The Ulvac G 50 D is a two-stage rotary vacuum pump rated for 50/60 Hz.
CategoryLab & Support Equipment - NE-550Ulvac
The Ulvac NE-550 is a multipurpose high-density, low-pressure plasma etching system used for chlorine etching.
CategoryEtch
