Waferpedia

Ulvac

SIV 500

DepositionUlvac SIV 500 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Ulvac SIV 500 is an in-line sputtering system used for thin-film deposition, including indium tin oxide (ITO). The SIV 500 features a 3-station process module (P1, P2, P3) and a 5 kW pulsed DC power supply.[1][2]

UlvacSIV 500
No photo available yet

Power

5 kW[1]

Vacuum

12 inch[1]

What it is

The Ulvac SIV 500 is a sputtering deposition system.[3][2]

The Ulvac SIV 500 is a PVD deposition system.[2]

How it works

The Ulvac SIV 500 uses a three-station process module with a pulsed DC power supply.[1][2]

The Ulvac SIV 500 includes a dedicated P3 station for ITO or other transparent conductive films, together with oxygen mass-flow control and a 13.56 MHz power supply and match network to maintain ITO stoichiometry.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

The Ulvac SIV 500 belongs in the thin-film deposition portion of the process flow, after substrate preparation and before later patterning or device integration steps.

Applications

The Ulvac SIV 500 is used for thin-film deposition, including indium tin oxide deposition.[1][2]

What do the numbers mean?

Power & electrical6

Pulsed DC power supply power
5 kW[1]
Accurate?
P3 sputtering power supply frequency
13.56 MHz[1]
Accurate?
Voltage
208 VAC +/- 5%, 3 phase, 60 Hz, 3 wire plus ground, 145.5 A[2]
Accurate?
Power supply
5 kW pulsed DC[1]
Accurate?
P3 dedicated to
ITO or other TCF with O₂ MFC and 13.56 MHz RF supply[1]
Accurate?
Voltage
208 VAC +/- 5%, 3 phase, 60 Hz, 145.5 A[2]
Accurate?

Vacuum & pumping3

Cryo pump size
12 inch[1]
Accurate?
Turbo/water pump size
12 inch[1]
Accurate?
Pumping
Roughing pump, turbomolecular/water pump, Ulvac 12" cryo pump[1]
Accurate?

Wafer handling5

Substrate size capability
up to 1000mm x 1000mm[2]
Accurate?
Substrate diameter max
8 inches[1]
Accurate?
Carrier size
500mm x 500mm[2]
Accurate?
Maximum substrate size
1000 mm × 1000 mm[2]
Accurate?
Supported wafer sizes
100 mm, 150 mm, 200 mm, 300 mm[2]
Accurate?

Dimensions & facilities1

Chamber dimensions
500mm x 420mm[1]
Accurate?

Configuration & options7

Process module stations
3 (P1, P2, P3)[1]
Accurate?
Magnetron sources
3[1]
Accurate?
DC planar sources
1[1]
Accurate?
Process modules
3-station (P1, P2, P3)[1]
Accurate?
Chamber size (base machine)
500 mm × 420 mm[1]
Accurate?
Pallet size (configured)
500 mm × 500 mm[2]
Accurate?
Sputter sources
Three magnetron sources and one DC planar source on XYZ stage[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
SIV 500 ITO—2016Configured for ITO sputtering with P3 dedicated to ITO, O₂ MFC, and 13.56 MHz power supply/match to maintain ITO stoichiometry.tarasemi.com[1]
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Pulsed DC power supply power5 kW[1]
  • P3 sputtering power supply frequency13.56 MHz[1]
  • Cryo pump size12 inch[1]
  • Turbo/water pump size12 inch[1]
  • Voltage208 VAC +/- 5%, 3 phase, 60 Hz, 3 wire plus ground, 145.5 A[2]
  • Power supply5 kW pulsed DC[1]
  • P3 dedicated toITO or other TCF with O₂ MFC and 13.56 MHz RF supply[1]
  • Voltage208 VAC +/- 5%, 3 phase, 60 Hz, 145.5 A[2]
  • PumpingRoughing pump, turbomolecular/water pump, Ulvac 12" cryo pump[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What type of deposition system is the Ulvac SIV 500?

The Ulvac SIV 500 is a sputtering system and a PVD deposition system.[3][2]

How many process stations does the Ulvac SIV 500 have?

The Ulvac SIV 500 has a three-station process module with stations P1, P2, and P3.[1][2]

Not publicly documented

The following facts about the SIV 500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SIV 500 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the SIV 500 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the SIV 500 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the SIV 500 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the SIV 500 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]tarasemi.com — tarasemi.comtarasemi.com
  2. [2]fabsurplus.com — fabsurplus.comfabsurplus.com
  3. [3]Equipment inventory listing
Was this page accurate?

Last updated Oct 7, 2026.

Compare with similar tools

View all →