Lam Research Concept One 200

Models in this family

1. Concept One 200

   Lam / Novellus Concept One 200 is a chemical vapor deposition system.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Concept One 200 CVD	—	1992	—	Equipment inventory listing[1]
   Concept One 200 PECVD	—	—	PECVD (Plasma-Enhanced) variant for TEOS deposition	Equipment inventory listing[2]

2. 

   Concept One 200 PECVD-TEOS

   The Lam / Novellus Concept One 200 PECVD-TEOS is a plasma-enhanced chemical vapor deposition tool for tetraethyl orthosilicate processing.

Sources