Veeco
The Veeco Waferstorm M 3305 is a lift-off machine for wet processing. The Waferstorm M 3305 uses a centrifugal edge-grip spin chuck for 150 mm wafers.[1]

Wafer size
Robotic Wafer Handler:
Power
415 VAC[2]
The Veeco Waferstorm M 3305 is a lift-off machine designed for wet processing in semiconductor manufacturing. The machine is manufactured by Veeco, formerly SSEC (Solid State Equipment Corporation).[1][2][3]
The Veeco Waferstorm M 3305 handles 150 mm wafers and includes a spin chuck with centrifugal edge grip. The machine is equipped with a robotic wafer handler featuring horizontal, vertical, rotary, and paddle axes, as well as wafer scanners and alignment systems with color cameras and PC image processing.[1]
The Waferstorm M 3305 includes NMP (N-Methylpyrrolidone) fresh and re-circulated supply systems, which are used for dissolving the sacrificial layer. The machine also features a process monitor system and a spin chuck for wafer rotation during chemical application. The robotic handler transfers wafers between cassettes, buffer stations, and the process chamber.[1]
The system is equipped with a UPLA filter and air ionizer bar for ESD control, and a CO2 fire suppression system for the handler frame. The machine supports horizontal cassette loading with two MCPs (total eight 150 mm cassettes) and includes a buffer station with two slots.[1]
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 300 Series | — | — | Stainless Steel with Mirror Finish, Windows 10 PC, SECS/GEM, additional features | Equipment inventory listing[1] |
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
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The Veeco Waferstorm M 3305 supports 150 mm wafers.[1]
Yes, the Veeco Waferstorm M 3305 is equipped with SECS/GEM software and is SEMI compliant.[1]
The machine uses a 150 mm centrifugal edge grip spin chuck.[1]
Yes, it includes a CO2 fire suppression system for the handler cover and frame, with IR detectors and linear heat detector wire.[1]
The following facts about the Waferstorm M 3305 Lift Off are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Waferstorm M 3305 Lift Off are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Waferstorm M 3305 Lift Off are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Waferstorm M 3305 Lift Off is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Waferstorm M 3305 Lift Off are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Waferstorm M 3305 Lift Off are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Sep 28, 2026.
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