SUSS MicroTec
MA 200 E Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedA mask aligner aligns a mask to the substrate surface and then exposes the resist through the mask pattern. The tool class uses precise mechanical registration before illumination so the printed pattern corresponds to the mask geometry.
Mask aligners are used when direct proximity or contact exposure is appropriate for pattern transfer. The class is suited to layered patterning work in which a photoresist image is created before later development and downstream processing.
Where it fits in the process flow
General reference — not yet source-verifiedThe MA 200 E Mask sits in the lithography step of a fabrication sequence. The tool is used after resist application and before resist development and subsequent pattern transfer steps.
The MA 200 E Mask supports front-end pattern definition for structures that will later be etched, deposited, or otherwise transferred into the underlying material stack.
Applications
General reference — not yet source-verifiedMask aligners are used for photolithographic patterning of wafers and other substrates. The equipment class is common in microfabrication work that requires mask-based transfer of fine geometric features.
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the MA 200 E Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the MA 200 E Mask are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 E Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 E Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 E Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 E Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]MA 200 E Mask — SUSS MicroTec | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 5, 2026.
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