Waferpedia

Plasma-Therm

Unaxis ICP

Unaxis ICP — Inventory photo
Fig. 01Unaxis ICPInventory photo[1]

Wafer size

Wafer auto load/unload

Power

RF System:[1]

Vacuum

Pressure Control:[1]

Gas delivery

Gas Box:[1]

What is it?

Plasma-Therm / Unaxis ICP Etcher is an inductively coupled plasma etcher with wafer auto load/unload and support for 2, 3, 4, 6, and 8 inch wafers.

What do the numbers mean?

Power & electrical2

RF System:[1]
Accurate?
Generator
ENI ACG 6 B[1]
Accurate?

Vacuum & pumping4

Pressure Control:[1]
Accurate?
MKS 627 Vacuum Gauge[1]
Accurate?
Pressure Control Range
100 mTorr[1]
Accurate?
Turbo Pump Limit Vacuum
5.0 E-6 Torr[1]
Accurate?

Wafer handling2

Wafer size
Wafer auto load/unload[1]
Accurate?
Temperature
Watlow 988 Chamber Chuck Temperature Control: (20-300°C) +/- 1°C[1]
Accurate?

Gas & chemistry9

Gas Box:[1]
Accurate?
Gas 1
UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1]
Accurate?
Gas 2
MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1]
Accurate?
Gas 3
MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1]
Accurate?
Gas 4
UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1]
Accurate?
Gas 5
MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1]
Accurate?
Gas 6
MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1]
Accurate?
Gas 7
UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1]
Accurate?
Gas 8
MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1]
Accurate?

Control & software2

Control Valve (VAT):[1]
Accurate?
VAT Valve Control
PM 5[1]
Accurate?

Configuration & options1

Chamber:[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationGas Box:[1]
  • Gas 1UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1]
  • Gas 2MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1]
  • Gas 3MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1]
  • Gas 4UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1]
  • Gas 5MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1]
  • Gas 6MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1]
  • Gas 7UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1]
  • Gas 8MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1]
  • ConfigurationRF System:[1]
  • GeneratorENI ACG 6 B[1]
  • ConfigurationPressure Control:[1]
  • ConfigurationMKS 627 Vacuum Gauge[1]
  • Pressure Control Range100 mTorr[1]
  • Turbo Pump Limit Vacuum5.0 E-6 Torr[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Unaxis ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Unaxis ICP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Unaxis ICP are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Unaxis ICP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Unaxis ICP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Unaxis ICP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Process Group Internships - UCSB Nanofab Wiki — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
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Last updated Jul 29, 2026.

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