Nikon
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The Nikon Scanner 204 B is a lithography stepper manufactured by Nikon. The Nikon Scanner 204 B supports 6-inch and 8-inch wafers. The Nikon Scanner 204 B is specified at 0.15 µm.[1][2][3]
A lithography stepper exposes photoresist in a repeated sequence of alignment and projection exposures across a wafer.
A stepper in this class uses a mask or reticle, precision wafer positioning, and optical reduction to transfer circuit patterns onto the resist-coated wafer.
A lithography stepper sits in the pattern-definition stage of semiconductor manufacturing.
The Nikon Scanner 204 B is used before downstream etch or deposition pattern transfer steps that follow resist patterning.
The Nikon Scanner 204 B is used for semiconductor photolithography on silicon wafers.
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The following facts about the Scanner 204 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Scanner 204 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Scanner 204 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Scanner 204 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Scanner 204 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Scanner 204 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 7, 2026.
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