Nikon
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The Nikon NSR 2205 EX 14 is a stepper used for lithography. The Nikon NSR 2205 EX 14 is designed for 8-inch (200 mm) wafers. The Nikon NSR 2205 EX 14 was produced in 1999.[1][2]

A stepper uses a projection lens to image a reticle onto a photoresist-coated wafer. The wafer is moved by a precision stage to each exposure field, and the pattern is repeated across the entire wafer. Illumination is typically provided by a mercury arc lamp or an excimer laser.
Steppers are used to pattern critical layers in integrated circuit fabrication. Applications include logic, memory, and other semiconductor devices that require tight overlay accuracy and fine resolution.
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The following facts about the NSR 2205 EX 14 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the NSR 2205 EX 14 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR 2205 EX 14 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2205 EX 14 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2205 EX 14 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR 2205 EX 14 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Oct 7, 2026.
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