Nikon
LV100ND
What it is
General reference — not yet source-verifiedThe LV100ND belongs to the class of upright, reflected-light optical microscopes used for high-resolution inspection and measurement of surfaces. Such systems are commonly employed for defect detection, dimensional verification, and critical feature review on wafers, photomasks, and other processed substrates.
What can it run?
Process applications and technology nodes documented for this tool.
- Optical inspection
- Brightfield imaging
- Darkfield imaging
- Differential interference contrast imaging
- Point-to-point distance measurement
What do the numbers mean?
Optics & imaging6
- Camera
- DS-Ri2 (18 Megapixel) on some configurations; also DS-Fi3 (5.9 Megapixel) and Digital Sight 10 (23.9 Megapixel) on others[1]
Control & software2
Configuration & options8
- Brightfield / darkfield
- 10X Ultra Wide Field brightfield and darkfield for all five lenses[1]
- Instrument count and locations
- Two microscopes in the Flexible Cleanroom and two in the Nanopatterning Cleanroom[1]
- DIC
- Selectable Nomarski Differential Interference Contrast (for top down lighting only) on some configurations[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What optical contrast methods are typically available?General reference — not yet source-verified
Common contrast methods include brightfield, darkfield, differential interference contrast (DIC), and polarized light. Some systems may also support fluorescence or confocal imaging for specialized applications.
Can this type of microscope perform automated measurements?General reference — not yet source-verified
Yes, many systems in this class can be equipped with motorized stages, auto-focus, and image analysis software to perform automated critical dimension measurements, defect mapping, and statistical process control.
What are typical maintenance requirements for such optical systems?General reference — not yet source-verified
Regular cleaning of optics, calibration of stage and focus mechanisms, and routine alignment checks are typical. Environmental control of temperature and humidity helps maintain measurement stability over time.
Not publicly documented
The following facts about the LV100ND are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the LV100ND are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the LV100ND are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the LV100ND are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the LV100ND are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the LV100ND is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]snsf.stanford.edu — snsf.stanford.edusnsf.stanford.edu
- [2]nano@stanford Equipment | nano@stanford — snf.stanford.edusnf.stanford.edu
- [3]Nanopatterning Cleanroom (NPC) | Stanford Nano Shared Facilities — snsf.stanford.edusnsf.stanford.edu
Last updated Oct 7, 2026.
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