Laurell
The Laurell WS-650-15 is a station-mounted spin coater. The Laurell WS-650-15 accommodates up to 300mm wafers. The Laurell WS-650-15 features a maximum rotational speed of 12,000 RPM.[1][2][3]

Wafer size
300mm
Power
95 to 240VAC, 47/63HZ, ~300 Watts[1]
The WS-650-15 accommodates wafers up to 300 mm and substrates up to 229 mm by 229 mm.[1][2][3]
The WS-650-15 features a maximum rotational speed of 12,000 RPM based on a 100 mm silicon wafer.[1][2][3]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| WS-650-15 B | 650-series | — | Described as the station-mounted WS-650-15 B spin coater. | web.archive.org[1] |
| WS-650-15B | 650-series | — | Described as the station-mounted WS-650-15B spin coater. | web.archive.org[2] |
| WS-650-15 B | 650-series | — | Described as the station-mounted WS-650-15 B spin coater. | web.archive.org[3] |
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Film thickness is primarily controlled by the spin speed and spin time, as well as the viscosity and concentration of the coating solution. Higher rotation speeds typically produce thinner films, while longer spin times allow the layer to settle until equilibrium is reached.
Substrates are commonly held onto the rotor by a vacuum chuck, which draws a low-pressure region through a porous or perforated plate. Some coaters use spring-loaded clamps or magnetic retention for substrates that cannot tolerate vacuum.
Spin coaters can handle a wide range of fluid materials, including photoresists, polymers, precursors for sol-gel chemistry, nanoparticle suspensions, and certain colloidal dispersions. The fluid must be sufficiently low in viscosity to flow evenly and must evaporate at a consistent rate during spinning.
Spin coaters are designed for flat, disk-shaped substrates, though alternative fixtures can accommodate square or irregular pieces. The maximum substrate diameter is constrained by the rotor clearance and the ability to maintain uniform centrifugal forces, but sizes vary among models.
The following facts about the WS-650-15 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-15 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the WS-650-15 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-650-15 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-650-15 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS-650-15 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 5, 2026.
The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.
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