Waferpedia

EV Group

6200 Mask

LithographyEV Group 6200 family
Research Quality: 50% complete

The EV Group 6200 Mask is a lithography tool configured for 6-inch and 8-inch wafers. The EV Group 6200 Mask includes 3 stations. The EV Group 6200 Mask includes backside alignment, top view alignment, and 5x optics.[1][2]

6200 Mask — Inventory photo
Fig. 016200 MaskInventory photo[1]

Performance

Backside alignment; top view alignment[1]

Optics

Mask Aligner[1]

What it is

The EV Group 6200 is a mask aligner configured for 6-inch and 8-inch wafers.[1][2]

How it works

The EV Group 6200 has three stations: a 6-inch chuck with mask holder, an 8-inch chuck with mask holder, and a 1000W light source.[1][2]

The machine supports backside alignment and top view alignment with 5x optics.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

Mask aligners are used in the lithography step of wafer fabrication, after photoresist coating and before development.

Applications

General reference — not yet source-verified

Backside alignment capability enables double-sided patterning, which is useful for MEMS devices such as pressure sensors and microfluidics.

What do the numbers mean?

Wafer handling4

6" Chuck + Mask holder[1]
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8" Chuck + Mask holder[1]
Accurate?
Wafer sizes
6, 8 inch[1]
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Wafer handling
6" Chuck + Mask holder; 8" Chuck + Mask holder[2]
Accurate?

Optics & imaging3

Backside alignment, top view alignment, optic 5x[1]
Accurate?
Tool type
Mask Aligner[1]
Accurate?
Optics
5x[1]
Accurate?

Performance1

Alignment
Backside alignment; top view alignment[1]
Accurate?

Configuration & options6

3 Stations:[1]
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Power
1000W light source[1]
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Manufacturer
EV Group[1]
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Model
6200[1]
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Stations
3 Stations[1]
Accurate?
Light source
1000W light source[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the EVG 6200 support?

The EVG 6200 supports 6-inch and 8-inch wafers.[1][2]

Does the EVG 6200 support backside alignment?

Yes, the EVG 6200 includes backside alignment capability.[1][2]

What is the power of the light source in the EVG 6200?

The EVG 6200 uses a 1000W light source.[1][2]

How many stations does the EVG 6200 have?

The EVG 6200 has three stations.[1][2]

What magnification is used for top view alignment on the EVG 6200?

The EVG 6200 uses 5x optics for top view alignment.[1][2]

Not publicly documented

The following facts about the 6200 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6200 Mask are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 6200 Mask are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 6200 Mask are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 6200 Mask are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 6200 Mask is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]Inventory photo
  4. [4]Inventory photo
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Last updated Oct 5, 2026.

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