CHA
Mark 50 E-Beam
The CHA Mark 50 is an electron-beam evaporator for thin film deposition. The CHA Mark 50 requires a 3-phase 110/220 Vac 50 Hz power supply. The CHA Mark 50 is limited to Class A and B metals and compounds.[1][2]
What it is
The CHA Mark 50 E-beam Evaporator appears in facility equipment use as a thin film deposition tool.[2]
How it works
General reference — not yet source-verifiedE-beam evaporation is used for vacuum deposition of thin films, especially when a controlled line-of-sight coating process is needed.
Where it fits in the process flow
General reference — not yet source-verifiedThe CHA Mark 50 E-Beam Evaporator is used after a substrate has been prepared for coating and before later patterning or device completion steps.
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Needs to fix some parts
- No high vapor pressure materials on substrates or sources in the evaporator
- Only approved materials are to be evaporated
- No oxide evaporation is done in this tool
What do the numbers mean?
Power & electrical8
- Ulvac HPS 1000 F E-Beam Power Supply[1]
Vacuum & pumping2
- Restrictions
- No high vapor pressure materials (Pb, Ca, Zn, Sn, etc.) on substrates or sources in the evaporator. Only evaporate approved materials. Do not evaporate source materials not on the data sheet. No oxide evaporation.[2]
Configuration & options20
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Phase3 Phase[1]
- Frequency50 Hz[1]
- ConfigurationUlvac HPS 1000 F E-Beam Power Supply[1]
- Power Supply3 Phase, 110/220 Vac, 50 Hz[1]
- E-Beam Power SupplyUlvac HPS 1000 F[1]
- RestrictionsNo high vapor pressure materials; no oxide evaporation[2]
- Voltage110/220 Vac[1]
- Power SupplyUlvac HPS 1000 F E-Beam Power Supply[1]
- Electrical Specifications3 Phase - 110 / 220 Vac - 50 Hz - 5 Wires[1]
- RestrictionsNo high vapor pressure materials (Pb, Ca, Zn, Sn, etc.) on substrates or sources in the evaporator. Only evaporate approved materials. Do not evaporate source materials not on the data sheet. No oxide evaporation.[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
How is film thickness controlled in e-beam deposition?General reference — not yet source-verified
Film thickness is typically monitored in real time using a quartz crystal microbalance (QCM) or an optical monitor. The operator sets a target thickness, and the system shuts off the beam or shutter once the desired thickness is reached.
Can e-beam evaporators handle large substrate sizes?General reference — not yet source-verified
Yes, e-beam evaporators can be designed to handle a range of substrate sizes, from small research samples to larger wafers or parts, depending on chamber dimensions and planetary fixturing.
How does e-beam evaporation compare to sputtering?General reference — not yet source-verified
E-beam evaporation offers higher deposition rates and better material utilization for many materials, but tends to produce films with less step coverage and more columnar microstructure. Sputtering generally gives better conformality and adhesion on complex topographies.
Not publicly documented
The following facts about the Mark 50 E-Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 50 E-Beam are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark 50 E-Beam are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark 50 E-Beam are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Mark 50 E-Beam is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Mark 50 E-Beam are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]cnfusers.cornell.edu — cnfusers.cornell.educnfusers.cornell.edu
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Equipment inventory listing
Last updated Sep 28, 2026.
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