Canon
The Canon FPA 3000 i 5 is a stepper for semiconductor wafer processing. The FPA 3000 i 5 + variant supports 8-inch wafers with notch alignment and L-type transfer. The FPA 3000 i 5 + runs software version V13.06B.06.[1]

A lithography stepper projects a patterned mask image onto a photosensitive wafer surface in repeated fields.
A lithography stepper sits in the pattern transfer stage of semiconductor front end processing.
A lithography stepper is used to form circuit patterns on photoresist-coated semiconductor wafers.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| FPA 3000 i 5 + | — | — | Intended for 8-inch wafers with notch alignment and L-type transfer; uses Canon's reticle cassette; no additional reticle library; no PPC unit; software version V13.06B.06; some units include a Rasco TBW-CD-83 transfer module with Compact Chamber (2000 vintage). | Equipment inventory listing[1] |
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The following facts about the FPA 3000 i 5 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 3000 i 5 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the FPA 3000 i 5 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FPA 3000 i 5 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FPA 3000 i 5 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FPA 3000 i 5 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 7, 2026.
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