Canon
FPA 3000 i 4 i-Line
Plate 01Canon FPA3000 I4 Stepper with www.CSISEMI.com
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What it is
How it works
General reference — not yet source-verifiedAn i-line stepper uses a step-and-repeat exposure method. A reticle containing the pattern for one or a few die is illuminated by a mercury vapor lamp filtered to i-line. The projection optics reduce the reticle image and focus it onto the wafer. After exposing one field, the wafer stage steps to the next field position and the exposure is repeated.
Where it fits in the process flow
General reference — not yet source-verifiedIn the photolithography process, an i-line stepper is used after the wafer has been coated with photoresist. The exposed wafer is then sent to a developer station and subsequently to etch or implant steps. i-line steppers are typically used for layers with relaxed critical dimensions, such as interlayer dielectrics, passivation layers, or back-end-of-line metallization in mature semiconductor nodes.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- PCBs from D-Rack missing
- Main computer missing
What do the numbers mean?
Wafer handling4
Optics & imaging6
- Lens data:[1]
Performance1
Control & software5
- Main computer[1]
Configuration & options7
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nikon NSR 2205 i 11 D i-Line— Same function class: Lithography, nullCompare in depthsource[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the typical resolution of an i-line stepper?General reference — not yet source-verified
The resolution of i-line steppers is determined by the numerical aperture of the projection lens and the exposure wavelength. For a standard i-line system, it is generally sufficient for patterning features down to a few tenths of a micrometer, suitable for mature semiconductor nodes.
How does overlay accuracy compare to other lithography tools?General reference — not yet source-verified
Overlay accuracy in i-line steppers is typically excellent for their intended technology nodes, with stage precision and alignment systems engineered to meet layer-to-layer registration requirements for logic and memory devices. However, advanced deep-ultraviolet scanners offer tighter overlay for sub-wavelength features.
What is the throughput of an i-line stepper?General reference — not yet source-verified
Throughput depends on exposure field size, resist sensitivity, and the efficiency of the step-and-repeat motion. Machines of this class are designed for high productivity in mass production, with wafer handling and stage speed optimized to maximize the number of wafers exposed per hour.
Not publicly documented
The following facts about the FPA 3000 i 4 i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 3000 i 4 i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FPA 3000 i 4 i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FPA 3000 i 4 i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the FPA 3000 i 4 i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FPA 3000 i 4 i-Line are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Equipment inventory listing
Last updated Sep 30, 2026.
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The Nikon NSR 2205 i 11 D i-Line Stepper is a Nikon lithography stepper specified for 4-inch wafers.
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