Waferpedia

Canon

FPA 3000 i 4

LithographyCanon FPA 3000 family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Canon FPA 3000 i 4 is a lithography stepper for wafer pattern transfer. The Canon FPA 3000 i 4 is a fine pattern aligner. The Canon FPA 3000 i 4 uses Kr F 365 nm exposure light.[1][2][3]

FPA 3000 i 4 — Inventory photo
Fig. 01FPA 3000 i 4Inventory photo[4]

Vacuum

2.0KW Super High Pressure Hg Lamp[3]

Performance

Uniformity – 2.76%[4]

Optics

6" square t=0.25"[3]

What it is

The Canon FPA 3000 i 4 is a lithography stepper for wafer pattern transfer.[4][1]

The Canon FPA 3000 i 4 is a fine pattern aligner in the Canon FPA 3000 family.[2]

How it works

The Canon FPA 3000 i 4 has 1/5x projection magnification, a numerical aperture of .45 to .63, a 22 by 22 field, and Kr F 365 nanometer exposure light.[3]

Where it fits in the process flow

General reference — not yet source-verified

Lithography tools sit in the front end of semiconductor patterning, after resist coating and before development and later etch or deposition transfer steps.

Applications

The Canon FPA 3000 i 4 is used for photolithographic patterning of semiconductor wafers.[1][2]

What do the numbers mean?

Vacuum & pumping1

Light source
2.0KW Super High Pressure Hg Lamp[3]2 sources
Accurate?

Wafer handling8

Wafer size
6 inch[4]
Accurate?
Wafer sizes
4" thru 8" SEMI Standard, JEIDA, Notch / Flat[3]
Accurate?
Reticle rotation accuracy
<±0.01μm on wafer[3]
Accurate?
Reticle rotation repeatability
<0.02μm) on wafer[3]
Accurate?
Wafer alignment
<0.06μm mean + 3sigma[3]
Accurate?
Throughput
>83 wafers/hour Φ6", 22mm, 32 shots[3]
Accurate?
Throughput
>59 wafers/hour Φ8", 22mm, 60 shots[3]
Accurate?
Wafer sizes
4", 6", 8"[8]
Accurate?

Optics & imaging10

Reticle size
6" square t=0.25"[3]
Accurate?
Reticle material
Quartz[3]
Accurate?
Projection magnification
1/5 X[3]
Accurate?
Numerical aperture
.45 - .63[3]
Accurate?
Exposure light
Kr F(365nm)[3]
Accurate?
Resolution
<0.35μm[3]
Accurate?
Illumination source
365[8]
Accurate?
Numerical aperture
0.45–0.63[8]
Accurate?
Reticle size
6[8]
Accurate?
Resolution
350[8]
Accurate?

Performance7

Uniformity – 2.76%[4]
Accurate?
Uniformity
1.0[8]2 sources
Accurate?
Focus repeatability
<0.10μm (3sigma)[3]
Accurate?
Leveling repeatability
<7ppm (3sigma)[3]
Accurate?
Step accuracy
<0.04μm (3sigma)[3]
Accurate?
Alignment accuracy
60[8]
Accurate?
Throughput
59[8]
Accurate?

Control & software2

Software version
V4.09A.08[2]
Accurate?
Software version
V4.08a.10[2]
Accurate?

Dimensions & facilities2

Depth of focus
>.8μm[3]
Accurate?
Depth of focus
>0.8µm[3]
Accurate?

Configuration & options21

Intensity 6530 ( W/m2 ) LPA – 0.846[4]
Accurate?
Manufacturer
Canon[4]
Accurate?
Model
FPA 3000 i 4[4]
Accurate?
Type
Fine Pattern Aligner[2]
Accurate?
Pattern material
2 layer Cr, 3 layer Cr[3]
Accurate?
Pellicle frame
Pattern Side Only[3]
Accurate?
Field size
22x22 17x26[3]
Accurate?
Intensity
6500 W/m2[3]
Accurate?
Image field deviation
<.5μm[3]
Accurate?
Distortion
<±0.05μm[3]
Accurate?
Minimum compensation range
>100ppm[3]
Accurate?
Scaling
<±0.5ppm[3]
Accurate?
Orthogonality
<±0.5ppm[3]
Accurate?
Model year
1998[8]
Accurate?
Serial number
605669[8]
Accurate?
Projection ratio
5:1[8]
Accurate?
Field
22 x 22[8]
Accurate?
Intensity
6,500[8]
Accurate?
Stage type
ABS[8]
Accurate?
Type
Lithography stepper[1]
Accurate?
Image field deviation
<0.5µm[3]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
FPA 3000 i 4 Fine Pattern——Described as a fine pattern aligner.waferpedia.com[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Light source2.0KW Super High Pressure Hg Lamp[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

How does a stepper differ from a scanner?General reference — not yet source-verified

A stepper exposes an entire field at once with the reticle and wafer stationary, then steps to the next field. A scanner, by contrast, moves the reticle and wafer synchronously during exposure, allowing a larger field size. Steppers of this class are generally simpler and offer higher reliability for the field sizes they support.

What factors affect the overlay accuracy of an i‑line stepper?General reference — not yet source-verified

Overlay accuracy depends on the precision of the wafer stage positioning, the quality of the alignment optics, thermal stability of the machine environment, and the accuracy of the reticle alignment marks. Regular calibration and maintenance are required to maintain specified overlay performance.

Not publicly documented

The following facts about the FPA 3000 i 4 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 3000 i 4 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the FPA 3000 i 4 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the FPA 3000 i 4 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the FPA 3000 i 4 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the FPA 3000 i 4 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (8)Every fact above is drawn from these public sources
  1. [1]waferpedia.com — waferpedia.comwaferpedia.com
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]servtechinc.com — servtechinc.comservtechinc.com
  4. [4]Inventory photo
  5. [5]Inventory photo
  6. [6]Inventory photo
  7. [7]Inventory photo
  8. [8]gcemarket.comgcemarket.com
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Last updated Oct 10, 2026.

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