Axcelis
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The Axcelis NV 10 SD 160 Ion is an ion implanter manufactured by Axcelis. The Axcelis NV 10 SD 160 Ion was built in 1997.[1][2]

The NV 10 SD 160 is an ion implantation system. Axcelis manufactures the NV 10 SD 160.[1][2]
Ion implanters produce a beam of ionized dopant species. The beam is filtered by a mass analyzer to isolate the desired isotope. The selected ions are then accelerated to a set energy and directed onto the wafer. Scanning ensures a uniform dose across the substrate.
The acceleration energy determines the depth of ion penetration. The ion dose controls the concentration of dopant atoms. Implantation is a non-thermal process, allowing precise doping profiles.
Ion implantation is used after photoresist patterning to dope selected regions of the wafer. The process is followed by an annealing step to activate the implanted atoms.
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The Axcelis NV 10 SD 160 Ion was manufactured in 1997.
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The following facts about the NV 10 SD 160 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the NV 10 SD 160 Ion are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented variants, configuration options, or revision breakpoints of the NV 10 SD 160 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV 10 SD 160 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV 10 SD 160 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV 10 SD 160 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 8, 2026.
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