Applied Materials
VIISta 810 XEri
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The VIISta 810 XEri is a medium-current ion implanter for 12-inch wafers.[1]
What it is
General reference — not yet source-verifiedIon implanters are used in semiconductor manufacturing to embed dopant ions into a substrate, altering its electrical conductivity.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation typically follows gate formation and before high-temperature anneal steps. The implanted layer is later activated by a thermal anneal process. Implantation can also be performed after spacer formation for source/drain engineering.
What do the numbers mean?
Wafer handling1
Configuration & options2
- Medium Current[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian EHPI E 220— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI 500— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the VIISta 810 XEri are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta 810 XEri are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta 810 XEri are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta 810 XEri are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta 810 XEri are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta 810 XEri is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Sep 22, 2026.
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The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
