Applied Materials
Precision Implant xR 200 S High Current
What it is
The Applied Materials Precision Implant xR 200 S High Current is an ion implantation tool.[2]
How it works
General reference — not yet source-verifiedAn ion implanter accelerates dopant ions and directs them into a wafer to modify near-surface electrical properties.
A high-current ion implanter class is used when large dopant doses must be delivered with controlled beam energy and implant conditions.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end semiconductor process used to introduce dopants after patterning steps define where the ions enter the wafer.
Ion implantation commonly follows mask formation and follows with thermal processing to activate implanted dopants and repair implantation damage.
Applications
The Precision Implant xR 200 S High Current is categorized under ion implantation equipment.[2]
What do the numbers mean?
Vacuum & pumping7
- Chamber with Liners Turbo Pump (2)[1]
- Leybold Turbo Mech Parts[1]
- 8500 Cryo Pump (2)[1]
- Backing Pumps (3)[1]
- Cryo Pumps (2)[1]
- Cryo Compressor Energy Range Acceleration Drift / Accel[1]
- Vacuum & pumping
- Chamber with Liners Turbo Pump (2); Leybold Turbo Mech Parts; 8500 Cryo Pump (2); Backing Pumps (3); Cryo Pumps (2); Cryo Compressor Energy Range Acceleration Drift / Accel[2]
Wafer handling1
Performance1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationChamber with Liners Turbo Pump (2)[1]
- ConfigurationLeybold Turbo Mech Parts[1]
- Configuration8500 Cryo Pump (2)[1]
- ConfigurationBacking Pumps (3)[1]
- ConfigurationCryo Pumps (2)[1]
- ConfigurationCryo Compressor Energy Range Acceleration Drift / Accel[1]
- Vacuum & pumpingChamber with Liners Turbo Pump (2); Leybold Turbo Mech Parts; 8500 Cryo Pump (2); Backing Pumps (3); Cryo Pumps (2); Cryo Compressor Energy Range Acceleration Drift / Accel[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Precision Implant xR 200 S High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Precision Implant xR 200 S High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Precision Implant xR 200 S High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Precision Implant xR 200 S High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Precision Implant xR 200 S High Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Precision Implant xR 200 S High Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 11, 2026.
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