Applied Materials
9500 Ion
The Applied Materials 9500 Ion Implanter is a semiconductor ion implantation tool designed for 6-inch wafers. The 9500 Ion Implanter features a Bernas ion source and a variable tilt angle of 0-7 degrees. The 9500 Ion Implanter includes a wafer orientor and SECS/GEM interface.[1][2]
How it works
The 9500 uses a Bernas-type ion source. The extraction system is a single bellows design. The implanter supports a variable tilt angle from zero to seven degrees. The beamline is of standard configuration. A plasma flood system (HDPFS) is present for charge neutralization. The machine includes a wafer orientor and a factory interface supporting SECS/GEM protocol.[1][2]
What do the numbers mean?
Power & electrical4
Vacuum & pumping10
Wafer handling11
Gas & chemistry10
Control & software1
Configuration & options40
- RGA[1]
Vintage & configurations
- 1993-06-01Vintage[3]
Manufacture date for a specific unit (PI-9500 variant)
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| PI-9500 | — | — | — | fabsurplus.com[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Frequency60 Hz[1]
- Turbo pumps typeSeiko Seiki[1]
- Mech pumps typeEdwards[1]
- Cryo pumps typeCryotorr[1]
- Line Frequency60 Hz[2]
- Gas Position 1Boron[1]
- Gas Position 2N/A[1]
- Gas Position 3Available SDS[1]
- Gas Position 4Arsine[1]
- Turbo Pump TypeSeiko Seiki[1]
- Mech Pump TypeEdwards[1]
- Cryo Pump TypeCryotorr[1]
- Gas Position 1 (Source 2)N/A[2]
- Gas Position 2 (Source 2)N/A[2]
- Gas Position 3 (Source 2)Phosphine[2]
- Gas Position 4 (Source 2)Arsine[2]
- Line Frequency (Source 2)60 Hz[2]
- Turbo Pump Type (Source 2)Leybold[2]
- Mech Pump Type (Source 2)Edwards[2]
- Cryo Pump Type (Source 2)CTI Helix Onboard[2]
- Hydrogen GeneratorNo[2]
- Toxic Gas AlarmNo[2]
- Auto Cryo PurgeNo[2]
- Gas position 4 (Arsine)Arsine[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of dopant species can this class of machine handle?General reference — not yet source-verified
High-current ion implanters are typically designed to handle common dopants such as boron, phosphorus, and arsenic. The specific species are selected based on the desired conductivity type and process requirements.
What is the typical throughput of such systems?General reference — not yet source-verified
Throughput varies by process conditions and wafer size, but high-current implanters are engineered for high productivity, often processing hundreds of wafers per hour for low-dose applications, though high-dose implants may reduce throughput.
What are the key maintenance considerations for ion implanters?General reference — not yet source-verified
Regular maintenance includes cleaning of the ion source, replacement of consumable parts (e.g., filaments), and periodic calibration of the beam and dose measurement systems to ensure process stability and uniformity.
How does this class of machine ensure uniform implantation across the wafer?General reference — not yet source-verified
Uniformity is achieved through precise scanning mechanisms—either moving the wafer through the beam or sweeping the beam over a stationary wafer—combined with real-time dose and angle monitoring to correct any non-uniformities.
Not publicly documented
The following facts about the 9500 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the 9500 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 9500 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 9500 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 9500 Ion are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 9500 Ion are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]inventory listing
- [3]fabsurplus.com — fabsurplus.comfabsurplus.com
Last updated Sep 30, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.