Varian

The Varian 350D is a medium current ion implanter that was the tool of choice for semiconductor doping in the early 1980s.

The Varian CC2 is a vacuum gauge controller that is part of the Denton Discovery 18 sputter deposition system.

Varian 20L 100V 200W Ion Pump Set is a sold-as-set pair of 20 litre ion pumps with magnet and 304 LN ESR fitting.

The Varian VHS 250 is a diffusion pump used for high vacuum applications.

The Varian P/N: E 11003911 is a scanner assembly.

Varian 911-5039 is a 60L ion pump with magnet and heat shields, rated at 100V and 500W.

The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.

The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.

The Varian Turbo-V 700HT is a microprocessor-controlled, solid-state frequency converter that drives Turbo-V 700 series pumps.

Varian E 500 EHPI Ion Implant System is a 6-inch wafer ion implant system with a Windows 7 control computer and V15.10.12 software.

The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.

The Varian E 500 Medium Current is an ion implanter for 8-inch wafers, introduced around 1996.

The Varian Clinac 2100C is a dual-energy medical linear accelerator manufactured from 1987 to 2007, supporting both photon and electron beam therapy treatments.

The Varian 2100CD is a high-energy linear accelerator manufactured between 1987 and 2007, part of the Clinac 2100 series, equipped with klystron power source, electron energies, and optional portal imaging, with multi-leaf collimator options of 80 or 120 leaves, and specifiable as 2100C/D or 2100CD variants.

The Varian Clinac 21EX Silhouette is a high-energy linear accelerator model produced by Varian, with a Silhouette option available for smaller room sizes and featuring 80-leaf or 120-leaf MLC configurations.

The Varian 23EX is a linear accelerator for radiation therapy, offering photon energies of 6 and 10/15/18/25 MV and electron energies, with a maximum photon dose rate of 600 MU/min.

The Varian 2300C/D is a variant of the Clinac 2100C/2100CD medical linear accelerator, manufactured from 1987 to 2007.

The Varian E 500 HP is a semiconductor test and probe tool from Varian.

The Varian E 500 EHP is a medium current ion implanter that supports 6-inch wafers, includes a thin wafer handling kit, can be converted to 8-inch, and runs on 208V 3-phase 50/60 Hz power.

The Varian Viision 200 is an ion implanter for 8-inch wafers.

The Varian Viision 200+ (also known as Viision 200 Plus and VIISion 200) is a high current ion implanter used for semiconductor wafer processing.

The Varian 981 2523 is a UHV sample manipulator.

The Varian E1000 is an ion implanter manufactured by Varian.

Varian Viision 80 is a medium current ion implanter with an 8-inch wafer size.

The Varian 948 is a helium mass spectrometer leak detector in the 947/948/960 family that includes a nitrogen cold trap.

The Varian 3118 is an electron beam evaporator system used for semiconductor thin film deposition, optical coating, and advanced materials research.

The Varian PTS 300 Leak Checker Scroll Pump is a tri-scroll vacuum pump with a rebuilt, working unit listed at 100-115V / 200-230V and 60/50 Hz.

The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.

The Varian 3118 10 E E-Beam Evaporator is an integrated system for deposition that includes vacuum pumps, a chamber, mounting pieces, a chiller, a power unit, a sweep controller, and an optical monitor.

The Varian EHPI 500 Medium Current is a medium-current ion implanter.

The Varian 921 066 is a pump controller.

The Varian 640 IR is a Fourier Transform Infrared (FT-IR) spectrometer designed for mid-IR and near-IR spectroscopy.

The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

The Varian M 2 i is a sputtering system for 6-inch wafers.

The Varian 929 5000 Pump Controller is a pump controller with a 95–130 Vac line input and 1100 Va / 250 Va electrical input ratings.

The Varian E 220 is an ion implanter described as a 3-phase, 5-wire, 208-volt system with E-clamp 6" capability and single-blade processing.

The Varian E 500 High Current Implanter is a high-current ion implanter for 6-inch wafers.

The Varian Kestrel 650 is an ion implanter for 200mm wafers.

The Varian E 11004390 Accelerator Column is a component used in semiconductor manufacturing equipment.

The Varian Clinac 21EX is a medical linear accelerator for radiation therapy, manufactured from 1998 to 2012.

The Varian E 11003931 is a neutral beam dump manufactured by Varian.

The Varian E 500 EHPI is a medium current ion implanter used for doping semiconductor wafers.

The Varian EHP 500 is a tool compatible with 8-inch wafers.

The Varian E 500 EHP Ion is an ion implanter in the Ion Implantation category.

The Varian Kestrel II 750 is a high-current ion implanter with an energy range of 10 to 3750 kV and processes 8-inch wafers in batches of up to 10 wafers.

The Varian NCR 3117 is a bell jar evaporative coater used for thin film deposition.

The Varian V 700 HT is a turbomolecular pump system that includes a controller.

The Varian VHS 4 is a vacuum pump with a pumping speed of 1200 l/s.

The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.

The Varian Kestrel 750 is an ion implanter that handles 200 mm wafers and is classified as a MEV Implanter.