Comparison ledger
Applied Materials VIISta HE XP, Axcelis GSD 200 E 2 High Current, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta HE XPApplied Materials | GSD 200 E 2 High CurrentAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Axcelis GSD 200 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | High Current[3] | Blade Server 120006095C Excluded[2] |
| Manufacturer | Applied Materials / Varian[3] | — |
| Model | VIISta HE XP[3] | — |
| Type | Implanter[3] | — |
| Current | High Current[3] | — |
| Wafer Size | 8 inch[3] | 8 inch[2] |
| Software Version | — | VM 8.0 (Virtual Machine)[2] |
| CIM | — | SECs[2] |
| Process | — | B11, BF2, As, P[2] |
| Handler System | — | Arm (Non HPES), In Air Handler[2] |
| Factory Interface | — | None[2] |
| Option System | — | Silicon Disk, SEF EGUN[2] |
| Process Species | — | B11, BF2, As, P[2] |
| Vintage | — | 2001[2] |
| Disk Drive | — | Direct-Drive[4] |
| Dose Type | — | Regular[4] |
| Source Type | — | ELS4 IHC-Source without Vaporizer[4] |
| Main Workstation | — | SUN Solaris AXI 3HE (special case)[4] |
| Second Workstation | — | SUN Sparc5 on cart with printer[4] |
| CIM Interface | — | SECs[2] |
| High Voltage Transformer | — | both Oil/Light[4] |
| Tower Color | — | red/yellow/green; no buzzer[4] |
| Network | — | 24-port 100MB Ethernet with Cisco Router[4] |
| Kit Cell Controller | — | 177[4] |
| Options | — | Accel-Highvoltage Probe installed, HPES-Upgrade installed[4] |
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