STS
The STS 320 is a parallel-plate reactive ion etching (RIE) tool manufactured by Surface Technology Systems. The STS 320 is designed for etching silicon, silicon nitride, and transition metals using fluorine-based chemistries. The STS 320 uses an RF frequency of 13.56 MHz and has a driven electrode area of about 900 cm².[1]
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the 320 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 320 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 320 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 320 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 320 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 320 are on record.
Answerable by: an OEM parts catalog or a service engineer
Last updated Oct 9, 2026.