Waferpedia

Solitec

5110 C Photoresist Spin

5110 C Photoresist Spin — Inventory photo
Fig. 015110 C Photoresist SpinInventory photo[1]
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Vacuum

3" Vacuum Chuck[1]

Gas delivery

Pressurized tank required[1]

What is it?

The Solitec 5110 C is a photoresist spin coater for wafers, masks, and substrates.

What do the numbers mean?

Vacuum & pumping2

3" Vacuum Chuck[1]
Accurate?
Automatic Teflon diaphragm pump[1]
Accurate?

Wafer handling2

Wafer Handling
Manual with loading paddle to center wafer[1]
Accurate?
Substrate Sizes (Max)
9" Round, 6" square, 9" diagonal rectangular[1]
Accurate?

Gas & chemistry3

Solvent Dispense
Pressurized tank required[1]
Accurate?
Resist Dispense:[1]
Accurate?
Resist coat (static or dynamic)[1]
Accurate?

Optics & imaging1

Tachometer
Digital readout from optical encoder, 10 rmp resolution[1]
Accurate?

Control & software4

Control Panel has 5 potentiometers for speed setting with individual 0-99.9s timers[1]
Accurate?
Process Control
Digital timers with manual programming, relay logic[1]
Accurate?
Speed Control:[1]
Accurate?
Closed loop servo with t10 rpm speed control[1]
Accurate?

Configuration & options8

OEM Operational Manuals and drawings[1]
Accurate?
Acceleration
Variable from 1,000 to 40,000 rpm/sec[1]
Accurate?
Time
Variable from 1 to 999 sec in 1 sec increments[1]
Accurate?
With precise dispense adjustment
0.5 to 38 mlt 1%, viscosity 4 to 10,000 centistokes[1]
Accurate?
Separate drawback adjustment[1]
Accurate?
Adjustable from 200 to 10,000 rpm[1]
Accurate?
Digital reference on spin and spread speeds[1]
Accurate?
Standard Process Sequence:[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Option A (P/N 5110C-1)——N2 spin solvent dispense; resist dispense; spread speed spin; final high speed spin.Equipment inventory listing[1]
Option B (P/N 5110C-2)——Resist dispense (tank required); spread speed spin; final high speed spin; spin dry (no N2).Equipment inventory listing[1]
Option C (P/N 5110C-3)——Solvent dispense (tank required); N2 spin; resist dispense; spread speed spin; final high speed spin.Equipment inventory listing[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Configuration3" Vacuum Chuck[1]
  • Solvent DispensePressurized tank required[1]
  • ConfigurationResist Dispense:[1]
  • ConfigurationAutomatic Teflon diaphragm pump[1]
  • ConfigurationResist coat (static or dynamic)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 5110 C Photoresist Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5110 C Photoresist Spin are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 5110 C Photoresist Spin are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 5110 C Photoresist Spin are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 5110 C Photoresist Spin is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 5110 C Photoresist Spin are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Sep 22, 2026.

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