Plasma-Therm
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Typical application areas include microelectromechanical systems (MEMS), photonics, solid-state lighting, and failure or yield analysis. The system is suitable for processing substrates for prototyping, pilot lines, and low-volume production.[2]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 790+ | — | — | Predecessor to Advanced Vacuum Vision 300 and 400 open-load etch and deposition systems. | web.archive.org[2] |
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The following facts about the 790 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 790 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 790 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 790 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 790 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 790 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Sep 26, 2026.
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.