Waferpedia

Nanometrics

HL5500

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The Nanometrics HL5500 is a Hall effect measurement system. The Nanometrics HL5500 measures resistivity, carrier concentration, and mobility in semiconductors. The Nanometrics HL5500 supports Van der Pauw, Hall bar, and bridge measurements.[1][2]

NanometricsHL5500
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What it is

The Nanometrics HL5500 is a turn-key, high performance Hall system for the measurement of resistivity, carrier concentration and mobility in semiconductors.[2]

The system is suitable for a wide variety of materials, including silicon and compound semiconductors and metal oxide films.[2]

The HL5500PC is a high-performance Hall Effect Measurement System with a 0.5 T permanent magnet.[1][4]

How it works

The HL5500 uses a permanent magnet with field reversal by magnet rotation, with a standard field strength of 0.32 T nominal ±1% of marked value.[2]

The system supports both AC (213 Hz) and DC measurement modes, with AC mode using phase sensitive detection to eliminate thermal effects and long term drifts and enhance signal-to-noise ratios.[2]

The HL5500 can measure sheet resistivities up to approximately 10 MΩ/square and Hall voltages of approximately 10 μV.[1][4]

With the optional HL5580 high impedance buffer amplifier/current source, sheet resistivity measurement capability extends to 100 GΩ/square and source currents as low as 1 pA.[1][4][2]

The instrument accepts Van der Pauw, bar, or bridge shaped geometries, and the software supports measurements to ASTM F-76 standard.[1][4][2]

The measurement head includes a four-probe micromanipulator system and a two-temperature measurement stage with removable dewar.[2]

Where it fits in the process flow

The system can perform temperature dependent measurements between 90 K and 550 K using an optional liquid nitrogen cryostat.[1][4]

The ideal sample size for the HL5500 is 1x1 to 1.5x1.5 cm2, up to 1 mm thick.[1][4]

Applications

The HL5500 is used for Hall effect measurement of resistivity, carrier concentration and mobility in a wide range of semiconductors.[1][4]

  • Hall measurement

What do the numbers mean?

Power & electrical2

Basic Hall voltage capability
Approximately 10 μV[1]
Accurate?
Measurement modes
AC (213 Hz) / DC[2]
Accurate?

Vacuum & pumping1

Optional temperature capability
90 K to 500 K with liquid nitrogen cryostat[2]
Accurate?

Wafer handling2

Measurement targets
Resistivity, carrier concentration, and mobility[1]
Accurate?
Sample size with probe system
Wafers up to 3-inch diameter[2]
Accurate?

Control & software1

Control platform
Microsoft Windows-based[2]
Accurate?

Configuration & options13

Function
Hall measurement[3]
Accurate?
Manufacturer
Nanometrics[3]
Accurate?
Model
HL5500[3]
Accurate?
Technique
Hall Effect Measurement[1]
Accurate?
Magnet
0.5 T permanent magnet[1]
Accurate?
Basic sheet resistivity capability
Up to approximately 10 MΩ/square[1]
Accurate?
Extended sheet resistivity capability with high-impedance buffer amplifier
Up to 100 GΩ/square[1]
Accurate?
Minimum source current with high-impedance buffer amplifier
As low as 1 pA[1]
Accurate?
Temperature-dependent measurement range
90 K to 550 K[1]
Accurate?
Ideal sample size
1 x 1 to 1.5 x 1.5 cm² (1 mm thick)[1]
Accurate?
Accepted geometries
Van der Pauw, bar, or bridge[1]
Accurate?
Measurement standards
Van der Pauw, Hall Bar and Bridge measurements to ASTM F-76 standard[2]
Accurate?
Optional buffer amplifier current source
Extends sheet resistivity measurement capability to 10^11 Ω/square[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Basic Hall voltage capabilityApproximately 10 μV[1]
  • Measurement modesAC (213 Hz) / DC[2]
  • Optional temperature capability90 K to 500 K with liquid nitrogen cryostat[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the standard magnetic field strength of the HL5500?

The standard magnet field strength is 0.32 T nominal ±1% of marked value, with optional field strengths of 0.1, 0.2, 0.4, and 0.5 T available. Some systems are shipped with a 0.5 T permanent magnet.[2][1]

What sample geometries does the HL5500 accept?

The system accepts Van der Pauw, bar, or bridge shaped geometries.[1][4][2]

Not publicly documented

The following facts about the HL5500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the HL5500 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the HL5500 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the HL5500 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the HL5500 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the HL5500 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]cenimat.fct.unl.pt — cenimat.fct.unl.ptcenimat.fct.unl.pt
  2. [2]quatek.com.tw — quatek.com.twquatek.com.tw
  3. [3]nanofab.ualberta.ca — nanofab.ualberta.cananofab.ualberta.ca
  4. [4]Hall effect: Biorad Nanometrics HL5500 - EMERGE — emerge-infrastructure.euemerge-infrastructure.eu
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Last updated Sep 22, 2026.