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Hitachi

Kokusai DJ 1206 V DF LPCVD

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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Where it fits in the process flow

The Hitachi Kokusai DJ 1206 V DF LPCVD sits in the thermal and diffusion segment of semiconductor manufacturing. The tool is used after wafer formation steps when a process requires thermal treatment or film growth in a furnace environment.[1][2]

Applications

The Hitachi Kokusai DJ 1206 V DF LPCVD is used for low-pressure chemical vapor deposition in semiconductor fabrication. The equipment class is suited to thin-film formation on wafers.[1]

What do the numbers mean?

Power & electrical1

Model
DJ 1206 V DF[1]
Accurate?

Vacuum & pumping1

Type
Low Pressure Chemical Vapor Deposition (LPCVD) Furnace[1]
Accurate?

Wafer handling1

Wafer Size
12 inch[1]
Accurate?

Configuration & options2

Manufacturer
Hitachi Kokusai[1]
Accurate?
Year
2007[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ModelDJ 1206 V DF[1]
  • TypeLow Pressure Chemical Vapor Deposition (LPCVD) Furnace[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What category does the DJ 1206 V DF LPCVD belong to?

The tool is categorized as Thermal / Diffusion.[2]

What process type is the DJ 1206 V DF LPCVD built for?

The tool is built for low-pressure chemical vapor deposition.[1]

Not publicly documented

The following facts about the Kokusai DJ 1206 V DF LPCVD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Kokusai DJ 1206 V DF LPCVD are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Kokusai DJ 1206 V DF LPCVD are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Kokusai DJ 1206 V DF LPCVD are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Kokusai DJ 1206 V DF LPCVD are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Kokusai DJ 1206 V DF LPCVD is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Kokusai DJ 1206 V DF LPCVD — Hitachi | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 1, 2026.

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