Waferpedia

Hitachi

Kokusai DD 802 V 6 H

Thermal / Diffusion
Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What it is

The Hitachi Kokusai DD 802 V 6 H is a furnace used for thermal processing in semiconductor manufacturing.[1]

How it works

General reference — not yet source-verified

A thermal diffusion furnace heats wafers in a controlled tube or chamber so that heat drives diffusion, oxidation, or similar high-temperature semiconductor steps.

A furnace of this class typically processes batches of wafers together under tightly controlled temperature and gas conditions.

Where it fits in the process flow

General reference — not yet source-verified

A diffusion furnace sits in the high-temperature portion of wafer processing, after earlier patterning or deposition steps and before later electrical test or final device completion steps.

Applications

General reference — not yet source-verified

A furnace of this class is used for semiconductor thermal processes that require sustained heat and controlled ambient conditions.

A thermal diffusion furnace is used in fabrication sequences that need dopant redistribution, oxidation, or other temperature-driven material changes.

What do the numbers mean?

Power & electrical1

Model
DD 802 V 6 H[1]
Accurate?

Configuration & options3

OEM
Hitachi Kokusai[1]
Accurate?
Equipment type
Furnace[1]
Accurate?
Vintage
1994[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ModelDD 802 V 6 H[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the equipment type?

The Hitachi Kokusai DD 802 V 6 H is a furnace used for thermal processing in semiconductor manufacturing.[1]

Not publicly documented

The following facts about the Kokusai DD 802 V 6 H are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Kokusai DD 802 V 6 H are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Kokusai DD 802 V 6 H are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Kokusai DD 802 V 6 H are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Kokusai DD 802 V 6 H are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Kokusai DD 802 V 6 H is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
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Last updated Oct 8, 2026.

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