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Headway

PWM32

Legacyspin controllerHeadway PWM32 family
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The PWM32 is a programmable spin controller used to coat substrates at adjustable spinning speeds from 50 to 10,000 RPM. The PWM32 runs processes as recipes identified by numbers 0 through 9, each composed of up to 9 steps, with per-step timers settable from 0 to 999.9 seconds. The PWM32 has been upgraded by Headway and the new product is now called model PWM50.[1][2]

PWM32 — web.archive.org
Fig. 01PWM32web.archive.org[2]
  • Plate 01Headway Research PWM32/CB-15, Spin Coater/ Wet Bench. Inv# 63217

    Bid ServicellcWatch on YouTube
  • Plate 02Headway Research Spinner PWM32 컨트롤러 테스트 영상!

    주식회사 엔지니어스톡Watch on YouTube

What it is

The Headway PWM32 is a wafer spin coater controller used with Headway spinner systems for substrate spin processing.[2][3][1][4]

The PWM32 is a spinner controller that coordinates recipe-driven operation, chuck vacuum control, and accessory functions in a spin-coating system.[1][4]

How it works

The PWM32 runs process recipes made of numbered steps, and each step can use a timer that terminates the step when the set time expires.[1]

The PWM32 manages chuck vacuum automatically or under operator override, and the controller can also coordinate accessory exhaust control and a powered lid when those options are present.[1][4]

Where it fits in the process flow

The PWM32 sits in the spin-coating portion of a fabrication flow, where it controls substrate rotation during coating and related steps such as dispense, vacuum hold, and optional exhaust handling.[3][1][4]

Applications

The PWM32 is used for coating substrates such as silicon wafers and small photomasks.[4]

The PWM32 is also used with broader spin-processing setups that include developers and fluid dispensing for photoresist and other high-purity fluids.[2]

  • Spinner control

What do the numbers mean?

Power & electrical1

Accessory power supply
24 VDC supplied by the controller for accessories such as the HDP98 fluid dispenser[2]
Accurate?

Vacuum & pumping4

Vacuum control
Automatic vacuum to chuck with manual override; rotation sensor forces vacuum on while motor is spinning[1]
Accurate?
Optional accessories
Powered lid (pneumatic actuator), substrate lifter/alignment tool, exhaust damper and bowl cover for closed-chamber inhibited drying spin coating, portable stand[4]
Accurate?
Vacuum control
automatic or manual, with rotation override[1]
Accurate?
Exhaust control
optional automatic control via program[1]
Accurate?

Wafer handling5

PS motor speed
Up to 10,000 rpm, for relatively light loads such as silicon wafers, small photomasks[4]
Accurate?
Maximum recommended substrate (CB15, 12.75-inch deflector)
12 inches[4]
Accurate?
Maximum recommended substrate (CB15, standard 11.35-inch deflector)
About 10.5 inches[4]
Accurate?
Maximum substrate (PWM32-PS-R790)
5-inch maximum[4]
Accurate?
Bowl options
R790 (max substrate 5 in), CB15 (max 12 in with BD motor), LS22 (larger substrates)[4]
Accurate?

Optics & imaging1

BD motor speed
Up to 2,500 rpm, for heavy loads such as compact disk masters, thick E-beam masks, LCD panels[4]
Accurate?

Control & software8

Type
Spinner spin controller[2]
Accurate?
Related equipment interface
HDP98 fluid dispenser interfaces directly to Headway PWM32-controlled spinners[2]
Accurate?
Related equipment interface
HDP98 fluid dispenser also interfaces to MP100- or PWM202-controlled spinners[2]
Accurate?
Recipe count
10 possible recipes, identified by numbers 0 through 9[1]
Accurate?
Steps per recipe
9 possible steps, identified by numbers 1 through 9[1]
Accurate?
Number of recipes
10 (0–9)[1]
Accurate?
Steps per recipe
up to 9[1]
Accurate?
Power requirement
24 VDC from controller or optional external supply[2]
Accurate?

Configuration & options7

Spinning speed range
50 to 10,000 RPM[3]
Accurate?
Step timer range
0 to 999.9 seconds per step[1]
Accurate?
System states
READY, RUNNING, REVIEWING, PROGRAMMING, ABORT (5 states)[1]
Accurate?
CB15 bowl inner diameter
15-inch I.D., with removable splash deflectors (12.75-inch and 11.35-inch openings)[4]
Accurate?
Speed range
50 to 10,000 rpm[3]
Accurate?
Timer range
0 to 999.9 seconds[1]
Accurate?
Motor options
PS motor: up to 10,000 rpm for light loads; BD motor: up to 2,500 rpm for heavy loads[4]
Accurate?

Vintage & configurations

  1. 2022Upgraded to PWM50[2]

    The PWM32 Spin Controller had been upgraded and the new product was called PWM50.

Documented models & variants

DesignationGenerationVintageChangesSource
PWM32-PS-CB15——Up to 10,000 rpm; for relatively light loads such as silicon wafers and small photomasks; CB15 bowl with 15-inch I.D. and recommended substrate limits stated in the source.headwayresearch.com[4]
PWM32-PS-R790——Up to 10,000 rpm for relatively light loads such as silicon wafers and small photomasks; substrates up to a 5-inch maximum.headwayresearch.com[4]
PWM32-BD-CB15——Up to 2,500 rpm for heavy loads such as compact disk masters, thick E-beam masks, LCD panels, and substrates requiring high inertia chucks; substrates up to a recommended 12-inch maximum.headwayresearch.com[4]
PWM32-BD-LS22——For substrates larger than 12 inches, or for heavy substrates at higher than 2,500 rpm; LS22 described as the next larger bowl.headwayresearch.com[4]
PWM32 Spin Controller——Described as the model that was upgraded and renamed PWM50.web.archive.org[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Vacuum controlAutomatic vacuum to chuck with manual override; rotation sensor forces vacuum on while motor is spinning[1]
  • Accessory power supply24 VDC supplied by the controller for accessories such as the HDP98 fluid dispenser[2]
  • Optional accessoriesPowered lid (pneumatic actuator), substrate lifter/alignment tool, exhaust damper and bowl cover for closed-chamber inhibited drying spin coating, portable stand[4]
  • Vacuum controlautomatic or manual, with rotation override[1]
  • Exhaust controloptional automatic control via program[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What process control structure does the PWM32 use?

The PWM32 uses numbered recipes and numbered steps, and each step has a programmable timer.[1]

Can the PWM32 control chuck vacuum automatically?

The PWM32 can manage chuck vacuum automatically, and the operator can also force vacuum on.[1]

What accessories can the PWM32 coordinate during a process?

The PWM32 can coordinate a powered lid and, if equipped, an accessory exhaust controller.[1][4]

Not publicly documented

The following facts about the PWM32 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the PWM32 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PWM32 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PWM32 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the PWM32 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the PWM32 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]web.archive.org — web.archive.orgweb.archive.org
  3. [3]mrl.illinois.edu — mrl.illinois.edumrl.illinois.edu
  4. [4]headwayresearch.com — headwayresearch.comheadwayresearch.com
  5. [5]Wayback Machine — web.archive.orgweb.archive.org
  6. [6]HEADWAY PWM32 PHOTORESIST COATER - J.M. Industries — jmind.comjmind.com
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Last updated Sep 23, 2026.