Filmetrics
The Filmetrics F30 is an in-situ thin-film thickness measurement instrument. The Filmetrics F30 measures deposition rates, film thickness, optical constants (n and k), and uniformity. The Filmetrics F30 uses a spectral reflectance system.[1][2]

The Filmetrics F30 measures semiconductors and dielectric layers.[1][2][3]
The Filmetrics F30 can measure smooth and translucent films and lightly absorbing films.[1][2][3]
The Filmetrics F30 includes example coverage for MBE and MOCVD films and semiconducting materials from AlGaN to GaInAsP.[1][2][3]
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The Filmetrics F30 measures deposition rates, film thickness, optical constants, and uniformity.[1][2][3]
The following facts about the F30 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the F30 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the F30 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the F30 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the F30 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the F30 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 4, 2026.