Waferpedia

EV Group

120

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

EVG 120 is an automated resist processing system from EV Group. EVG 120 supports wafers up to 200 mm. EVG 120 offers spin coating, spray coating, and developing.[1][2][3]

EV Group120
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Gas delivery

Automated resist processing system[2]

Optics

50 nm to 50 micron[3]

What it is

The EV Group 120 is an automated resist processing system.[2]

The EV Group 120 is a coating and developing tool used for lithography-related resist processing.[1]

The EV Group 120 is a wafer-processing machine that supports spin coating, spray coating, and developing.[2]

The EV Group 120 supports wafers up to 200 mm.[2]

How it works

The EV Group 120 uses a modular configuration with spin coating, spray coating, development, and bake or chill units.[2]

The EV Group 120 includes wafer handling options for single wafers, double edge exclusion, edge handling, and wafer flipping.[2]

Where it fits in the process flow

The EV Group 120 serves low-volume manufacturing and high-volume manufacturing.[2]

The EV Group 120 supports applications in photolithography, wafer bonding, and nanoimprint lithography.[2]

Applications

The EV Group 120 processes thin resists, thick resists, dielectrics, colored resists, and adhesives.[2]

The EV Group 120 supports coating thickness from 100 nm to several hundred µm.[2]

The EV Group 120 supports applications in advanced packaging, MEMS, image sensors, photonics, power devices, wafer probe cards, and other semiconductor device areas.[3]

The EV Group 120 supports resist materials including positive tone and negative tone resists, dielectric materials such as PI and PBO, and black, color, and IR resists.[3]

What do the numbers mean?

Wafer handling3

Wafer diameter (substrate size)
Up to 200 mm[2]
Accurate?
Wafer edge exposure
Included[2]
Accurate?
Supported substrate sizes
2 inches up to 200 mm[3]
Accurate?

Gas & chemistry2

System type
Automated resist processing system[2]
Accurate?
In-situ resist thickness measurement
Included[2]
Accurate?

Optics & imaging1

Measurement range
50 nm to 50 micron[3]
Accurate?

Configuration & options5

Equipment type
Automatic Coating and Developing Tool[1]
Accurate?
Category
Automatic Coating and Developing Tool[1]
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Available modules
Spin / spray / develop; bake / chill units[2]
Accurate?
Processing capacity
Up to 2 coating or development modules and 14 hot/chill plates[2]
Accurate?
Dispense viscosity
Up to 50,000 cP[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • System typeAutomated resist processing system[2]
  • In-situ resist thickness measurementIncluded[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the typical throughput of an automatic coating and developing tool?General reference — not yet source-verified

Throughput depends on the number of coating and development modules, the process recipe (spin times, bake durations, cool-down periods), and the degree of parallelism. Systems in this class can process multiple substrates per hour, with some high-end track systems achieving very high throughput for volume production. For a mid-range standalone tool, throughput is generally a few tens of wafers per hour.

How does this tool achieve uniform film thickness across the substrate?General reference — not yet source-verified

Uniformity is controlled by several factors: the spin speed profile (acceleration and final speed), the dispense method (static or dynamic), the substrate chuck design, and the surrounding airflow. Automated tools use precision dispense pumps and closed-loop speed control to maintain repeatability. Edge-bead removal and backside rinse features further ensure that the film is consistent and free of defects near the substrate edge.

Not publicly documented

The following facts about the 120 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 120 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 120 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 120 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 120 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 120 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]tudelft.nl — tudelft.nltudelft.nl
  2. [2]evgroup.com — evgroup.comevgroup.com
  3. [3]evgroup.com — evgroup.comevgroup.com
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Last updated Oct 3, 2026.