Electroglas
Electroglas EG5 is a wafer prober line. Electroglas EG5|300 ARGOS is an Electroglas wafer prober. Electroglas EG5|300 ARGOS is capable of handling 150mm, 200mm, and 300mm wafers.[1]

Wafer size
150mm
Performance
±2.5 micron[1]
The EG5|300 ARGOS is a variant of the EG5 platform designed for 300 mm wafers, targeting high-accuracy probing of leading-edge devices. The system achieves a probe-to-pad accuracy of ±2.5 micrometer and a stepping accuracy of 1.0 micrometer.[1]
The EG5|300 ARGOS uses an air-bearing, closed-loop linear motion system that is wear- and maintenance-free. The stage design and motion control algorithms provide 1.0 micrometer stepping accuracy while maintaining high stepping speeds.[1]
The system includes an integrated alignment system that enables the ±2.5 micrometer probe-to-pad accuracy, which is critical for contacting fine-pitch pads on advanced devices.[1]
Wafer probers are used for device characterization, parametric testing, and sort testing to classify die by performance and yield.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| EG5|300 ARGOS | — | — | Described as Electroglas' highest accuracy 300mm wafer prober; includes precise stepping accuracy, integrated alignment system, air bearing closed-loop linear motion system, and capability for 150mm, 200mm, and 300mm wafers. | web.archive.org[1] |
| EG5|300e | — | — | Fine-pitch probing for in-line parametric test structures. | web.archive.org[1] |
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A wafer prober positions a semiconductor wafer beneath a probe card, lowers the probes onto the bond pads of each die, and electrically connects those pads to a test system for measurement.
The prober uses optical alignment and pattern recognition to locate fiducial marks and pad sites on the wafer, then moves the wafer in a step-and-repeat manner so each die can be probed at the correct position.
Wafer probers support direct-current and high-frequency electrical tests, parametric measurements, functional test, and simple reliability screening, depending on the instrumentation connected to the system.
Wafer flatness, pad topology, probe tip planarity, stage drift, thermal expansion, and contact force all influence measurement integrity. Calibration and routine cleaning of probe tips are needed to maintain consistent performance.
The following facts about the EG5 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EG5 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the EG5 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EG5 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EG5 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EG5 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 4, 2026.
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