Applied Materials
U 200 HDP-CVD Dome
Provisional entry — research in progress
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The Applied Materials U 200 HDP-CVD Dome is a ceramic dome component for high density plasma chemical vapor deposition (HDP-CVD). The U 200 HDP-CVD Dome is designed for use with the Applied Materials P 5200 system.[1][2]
What it is
The Applied Materials U 200 HDP-CVD Dome is a ceramic dome component for the Applied Materials P 5200 high-density plasma chemical vapor deposition system.[1][2]
How it works
General reference — not yet source-verifiedIn HDP-CVD, a vacuum chamber is evacuated and precursor gases are introduced. A radio-frequency or microwave source transmits energy through the ceramic dome, ionizing the gases into a plasma. The plasma contains reactive species that react and deposit a solid film onto a substrate. The substrate is often heated to control film properties.
The ceramic dome is specifically designed to be transparent to the electromagnetic radiation used, while withstanding the thermal and chemical stress of the process. The dome is usually made of high-purity alumina or quartz.
Where it fits in the process flow
General reference — not yet source-verifiedHDP-CVD is used in semiconductor manufacturing to deposit thin films with precise thickness and composition. HDP-CVD is typically employed after substrate preparation and cleaning. HDP-CVD can be used before or after other deposition steps such as sputtering or evaporation. The low-temperature nature of the plasma process allows coating of temperature-sensitive substrates.
Applications
General reference — not yet source-verifiedHDP-CVD systems are used to deposit dielectric layers such as silicon nitride and silicon dioxide for insulation and protection in microelectronics. HDP-CVD systems are also used for depositing conformal coatings on complex three-dimensional structures, such as in MEMS devices. The process creates thin-film barriers in packaging and optical components.
What do the numbers mean?
Gas & chemistry1
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ProcessHigh Density Plasma Chemical Vapor Deposition (HDP-CVD)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
Not publicly documented
The following facts about the U 200 HDP-CVD Dome are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the U 200 HDP-CVD Dome are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the U 200 HDP-CVD Dome are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the U 200 HDP-CVD Dome are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the U 200 HDP-CVD Dome are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the U 200 HDP-CVD Dome is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]U 200 HDP-CVD Dome — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 28, 2026.
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