Waferpedia

Angstrom Engineering

EvoVac

The Angstrom EvoVac Electron Beam Evaporator is a load locked PVD tool which evaporates high melting point materials, such as refractory metals and ceramics, using an electron beam. The EvoVac provides multiple sources of flexibility in its deposition system including resistive thermal evaporation, ion assisted and sputter deposition, as well as principal electron beam evaporation. The EvoVac features a 6 pocket E-beam source, 15 cc crucibles, and a programmable 2-axis sweep controller.[1]

EvoVac — pnf.uchicago.edu
Fig. 01EvoVacpnf.uchicago.edu[1]

Wafer size

6 in

Performance

high[1]

Optics

Electron beam evaporation[1]

How it works

The EvoVac uses a six-pocket electron beam source with fifteen cubic centimeter crucibles. A programmable two-axis sweep controller directs the beam. The system includes a Kaufman gridless ion source for ion beam assisted deposition, in-situ substrate pre-cleaning, low energy ion beam etching, and surface modification. Advanced multi-layer deposition control enables precise layer monitoring. The tool also features a pneumatic airline filter and long source-to-substrate distances.[1]

Applications

Applications include electronic and optical semiconductor films, wear resistant and thermal barrier coatings, and hard coatings for tools. The system is also used for depositing refractory metals and ceramics.[1]

  • Electronic and optical semiconductor films
  • Wear resistant and thermal barrier coatings
  • Hard coatings for tools

What do the numbers mean?

Wafer handling6

Wafer size
Wafers to 6 in[1]
Accurate?
Source-to-substrate distance
Long source to substrate distances[1]
Accurate?
In-situ functions
In-situ substrate pre-cleaning, low energy ion beam etching, and surface modification[1]
Accurate?
Load locked
yes[1]
Accurate?
Maximum wafer size
6 inches[1]
Accurate?
In-situ substrate pre-cleaning
yes[1]
Accurate?

Optics & imaging1

Primary process
Electron beam evaporation[1]
Accurate?

Performance1

Deposition rate
high[1]
Accurate?

Control & software4

Sweep controller
Programmable 2-axis sweep controller[1]
Accurate?
Deposition control
Advanced multi-layer deposition control for precise layer monitoring[1]
Accurate?
Sweep controller
programmable 2-axis[1]
Accurate?
Multi-layer deposition control
advanced[1]
Accurate?

Configuration & options11

Tool type
Load-locked PVD tool[1]
Accurate?
Additional deposition modes
Resistive thermal evaporation, ion assisted deposition, and sputter deposition[1]
Accurate?
E-beam source
6 pocket E-beam source[1]
Accurate?
Crucible volume
15 cc crucibles[1]
Accurate?
Ion source
Kaufman gridless ion source[1]
Accurate?
E-beam source pockets
6[1]
Accurate?
Crucible capacity
15 cc[1]
Accurate?
Ion source type
Kaufman gridless[1]
Accurate?
Low energy ion beam etching
yes[1]
Accurate?
Surface modification
yes[1]
Accurate?
Pneumatic airline filter
yes[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the EvoVac are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EvoVac are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EvoVac are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EvoVac are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EvoVac are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EvoVac is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]pnf.uchicago.edu — pnf.uchicago.edupnf.uchicago.edu
  2. [2]Resource Scheduler & Rates | Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) | Universi — colorado.educolorado.edu
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Last updated Sep 21, 2026.

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