AJA
A300-XP
The AJA A300-XP Series is a family of UHV magnetron sputtering sources. The A300-XP Series improves on the A300 series with higher pressure operation and improved magnetic material sputtering performance. Variants include the A320-XP (2" target), A330-XP (3" target), A340-XP (4" target), and the A310 miniature series.[1][2]
What it is
The AJA A300-XP is a magnetron sputtering source for physical vapor deposition.[1]
The AJA A300-XP is a high-vacuum and ultrahigh-vacuum source used in thin-film deposition systems.[1]
How it works
The A300-XP uses a magnetron source architecture with a modular magnet array.[1]
The A300-XP supports higher pressure operation, improved magnetic material sputtering performance, and a larger product range.[1]
The A300-XP family includes sources with in-situ tilt, pneumatic shutter, gas ring, conical chimney, and integral gas injection.[1]
Where it fits in the process flow
The A300-XP is used for work that requires high-vacuum or ultrahigh-vacuum sputtering conditions.[1]
Applications
The A300-XP is applied to semiconductor conductive metal, resistive metal, and insulating films.[2]
The A300-XP is applied to transparent electrical conductors, optical communications films, wear-resistant films, lens coatings, precious metals, thin-film sensors, magnetic storage media and heads, and photovoltaic thin films.[2]
- Semiconductor
- Conductive metal, resistive metal, and insulating films
- Transparent electrical conductors
- Optical communications applications
- Wear resistant films
- Lens coatings
- Precious metals
- Thin film sensors
- Coatings for surgical/medical implements and implants
- Magnetic storage media and heads
- Photovoltaic thin films
What do the numbers mean?
Power & electrical1
Vacuum & pumping3
- Stated improvements
- Higher pressure operation, improved magnetic material sputtering performance, and a larger product range[1]
- Key Features
- Modular magnet array isolated from cooling water, integral gas injection and chimney, efficient target cooling with no vacuum/water seals, clamped target mounting, in-situ tilt option[1]
Wafer handling2
- A330-XP substrate orientation example
- Con-focal orientation for uniform deposition onto 150 mm diameter substrates[1]
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| A320-XP | — | — | Typical 2" UHV source with in-situ tilt, pneumatic shutter, gas ring, conical chimney, and integral gas injection. | web.archive.org[1] |
| A330-XP | — | — | UHV magnetron sputter source with in-situ tilt shown in a con-focal orientation for uniform deposition onto 150 mm diameter substrates. | web.archive.org[1] |
| A340-XP | — | — | 4" target UHV magnetron sputtering source on 8" CF rotatable flange with chimney, gas ring, and pneumatic shutter. | web.archive.org[1] |
| A310 Series (A310-XP) | — | — | Miniature UHV source fitting through 2.75" CF flange; full ceramic-to-metal construction; target changes by one hand; ideal for surface science and substrates up to 2" Ø | web.archive.org[1] |
What replaced it?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Stated improvementsHigher pressure operation, improved magnetic material sputtering performance, and a larger product range[1]
- Operating Pressure Range0.3 mTorr – 1.0 Torr[1]
- CompatibilityRF and DC operation[1]
- Key FeaturesModular magnet array isolated from cooling water, integral gas injection and chimney, efficient target cooling with no vacuum/water seals, clamped target mounting, in-situ tilt option[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What operating environments does the A300-XP support?
The A300-XP supports high-vacuum and ultrahigh-vacuum sputtering use.[1]
What process categories is the A300-XP used for?
The A300-XP is used for semiconductor films, optical communications films, wear-resistant films, lens coatings, thin-film sensors, magnetic storage media and heads, and photovoltaic thin films.[2]
Not publicly documented
The following facts about the A300-XP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the A300-XP are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the A300-XP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the A300-XP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the A300-XP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the A300-XP are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]HV R&D SPUTTERING SOURCES: STILETTO SERIES - AJA International — web.archive.orgweb.archive.org
- [3]Batch Coating Sputtering Systems - AJA International, Inc. — web.archive.orgweb.archive.org
Last updated Oct 4, 2026.
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