Tystar Tytan 1600 LPCVD

Models in this family

1. 

   Tytan 1600 LPCVD

   The Tystar Tytan 1600 LPCVD is a low pressure chemical vapor deposition system.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Tytan 1600 LPCVD Carbon Nanotube Growth	—	—	Includes rolling resistance furnace with six-zone heating, pre-heated gas line to 150°C, dry scrubber (Jupiter Scientific Callisto), dry pumping system (Edwards iH), and air-to-water heat exchanger; configured for carbon nanotube synthesis with process quartzware for 200mm x 200mm substrates up to 32 sheets.	semistarcorp.com[1]
   Mini Tytan 1600 Horizontal Furnace, 1 Stack, 150 mm, LPCVD	—	—	Reduced footprint, single tube (1 stack), 150mm wafer size, 50 wafer capacity, 18 inch flat zone; includes host supervisor and loading assist arm; configured for LPCVD.	semistarcorp.com[2]

Sources