Tool family
Oxford Instruments NGP80 is mentioned in the sources as an Oxford NGP80 RIE equipment entry.
The Oxford Instruments PlasmaPro NGP80 is a modular, benchtop-scale plasma processing platform for precision thin-film deposition and reactive ion etching (RIE).
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| NGP80 RIE | — | — | Dedicated reactive ion etch configuration with separate showerhead and matching network. | scribd.com[1] |
| NGP80 PECVD | — | — | Dedicated plasma-enhanced chemical vapor deposition configuration for uniform dielectric film deposition with selectable high/low frequency plasma power for stress control. | scribd.com[1] |
| NGP80 ICP | — | — | Inductively coupled plasma configuration with electrostatic shield for low damage, high rate etching. | scribd.com[1] |
| NGP80 RIE/PE | — | — | Combined RIE and plasma etch (PE) mode in a single system, combining anisotropy of RIE with selectivity of PE. | scribd.com[1] |