Nikon NSR

Models in this family

1. NSR 1505 G 6 E

   The Nikon NSR 1505 G 6 E is a 6-inch stepper described as a 0.65um G-line system.

2. NSR 4425 i i-Line

   The Nikon NSR 4425 i i-Line is an i-line stepper for lithography designed for 8-inch wafers with a resolution of 0.35 µm.

3. NSR i 11 C i-Line
4. NSR i 14 E i-Line

   The Nikon NSR i 14 E is an i-line stepper.

5. NSR S 205 C

   The Nikon NSR S 205 C is a scanner with 12-inch wafer size support and 248nm KrF exposure.

6. 

   NSR S 207 D

   The Nikon NSR S 207 D is a lithography system used in semiconductor manufacturing for patterning circuit layers onto wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   NSR S 207 D with Cymer laser	—	2005	Listed as a Nikon NSR S 207 D stepper with Cymer laser.	Equipment inventory listing[1]
   NSR S 207 D with Gigaphoton laser	—	2005	Listed as a Nikon NSR S 207 D stepper with Gigaphoton laser.	Equipment inventory listing[2]
   NSR S 207 D with G41K2 Gigaphoton laser	—	2004	Listed as a Nikon NSR S 207 D stepper with G41K2 Gigaphoton laser.	Equipment inventory listing[3]
   NSR S 207 D machine only	—	—	Listed as the Nikon NSR S 207 D stepper machine only.	Equipment inventory listing[4]
   Nikon NSR S 207 D with Cymer laser	—	2005–2005	Configured with a Cymer laser.	Equipment inventory listing[1]
   Nikon NSR S 207 D with Gigaphoton laser	—	2005–2005	Configured with a Gigaphoton laser.	Equipment inventory listing[2]
   Nikon NSR S 207 D with Gigaphoton laser (second unit)	—	2005–2005	Configured with a Gigaphoton laser.	Equipment inventory listing[5]
   Nikon NSR S 207 D with G41K2 Gigaphoton laser	—	2004–2004	Configured with a G41K2 Gigaphoton laser.	Equipment inventory listing[3]

7. NSR S 210 D

   The Nikon NSR S 210 D is a lithography system used for photolithographic patterning in semiconductor manufacturing, belonging to the class of projection aligners that transfer circuit patterns from a reticle onto a photosensitive-coated substrate.

8. NSR S 306 E
9. 

   NSR S 307 E

   The Nikon NSR S 307 E is a deep UV lithography scanner that operates at a wavelength of 193 nm using an ArF excimer laser.

10. NSR S 609 B ArF Immersion
11. 

    NSR SF 100 i-Line

    The Nikon NSR-SF100 is an i-line scan field stepper that achieves resolutions of 0.4 microns or smaller with a 1:4 reduction ratio on an exposure field of 25 x 33 mm.

12. 

    NSR SF 140 i-Line
13. 

    NSR SF 155 i-Line

    The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.

14. 

    NSR SF 200

    The Nikon NSR SF 200 is a semiconductor equipment tool identified with a 6-inch wafer size.

15. 

    NSR TFH i 14 DL i-Line

Sources