Comparison ledger
Varian 160 XP, Varian Kestrel II 750, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 160 XPVarian | Kestrel II 750Varian |
|---|---|---|
| OEM | Varian | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | 10 Site Disk, 10 Wafer per Batch |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Varian 160 XP | Varian Kestrel II 750 |
| Cited variants |
| — |
| Specifications | ||
| Configuration (160 XP Ion variant) | 150mm High Current IMP[1] | — |
| Configuration | — | High current[2] |
| Energy Range | — | 10 - 3750 kV[3] |
| Wafer size | — | 10 Site Disk, 10 Wafer per Batch[4] |
| Voltage | — | 30 kV Terminal PS[3] |
| Wafer Size | — | 8 inch[2] |
| Batch Size | — | 10 Wafers per Batch[3] |
| Disk Sites | — | 10 Site Disk[3] |
| Gas Modules | — | 4 Gas Modules[3] |
| Gases | — | Argon (factory inlet), PH3 SDS, AsH3 SDS, BF3 SDS[3] |
| Automatic Handling | — | Yes[3] |
| Software Version | — | 6.41[4] |
| High Current | — | Yes[4] |
| Power Supply Interface (PSI) Controller | — | Included[4] |
| Source Vacuum Controller | — | Included[4] |
| Manipulator Controller | — | Included[4] |
| 30 kV Terminal PS | — | Included[4] |
| 60 kV Tube Lens PS | — | Included[4] |
| Category | — | Ion Implantation[4] |
| Handling system | — | Automatic Handling system[3] |
| Gas box | — | Fully Automated Gas Box, 4 Gas Modules[3] |
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