Comparison ledger
Ulvac SOPHI 200 Ion, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SOPHI 200 IonUlvac | |
|---|---|---|
| OEM | Ulvac | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ulvac SOPHI 200 Ion | Varian 0216 7696, E 11368072 ESC |
| Specifications | ||
| Dose range (actual dose | 1010~1014 ions/cm2)[1] | — |
| Beam current (~500μA) - Throughput | more than 100 pieces/h (6in)[1] | — |
| Configuration | — | Platen ADV-S Type[2] |
| Type | — | ESC Platen ADV-S Type[2] |
| Category | — | Ion Implantation[3] |
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