Comparison ledger
CEE 100, Perkin Elmer Micralign, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | MicralignPerkin Elmer |
|---|---|---|
| OEM | CEE | Perkin Elmer |
| Category | Lithography | Lithography |
| Wafer size | 6" | 2-inch, 2.5-inch, or 3-inch wafers; optionally 4×4-inch, 3.5×3.5-inch, or 3×3-inch masks |
| Process node | — | — |
| Introduced | — | 1973 |
| Production run | — | 1971–1990 |
| Lifecycle | — | Discontinued |
| Lifecycle milestones | — | 1990 Divestiture |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Perkin Elmer Micralign |
| Cited variants |
| |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[3] | — |
| Programmable programs | 10 programs[3] | — |
| Steps per program | up to 10 steps[3] | — |
| Programmable step parameters | Acceleration, Speed, Time[3] | — |
| Associated document | CEE Model 100CB Spinner.doc[3] | — |
| Wafer size | Up to 6 inches[3] | — |
| Programs | 10 programs each with up to 10 steps[3] | — |
| Control parameters | Acceleration, Speed, Time[3] | — |
| OEM | — | Perkin-Elmer[2] |
| Model family | — | Micralign[2] |
| Type | — | projection aligner[2] |
| Introduction year | — | 1973[2] |
| First sold model | — | Micralign 100[2] |
| First sold | — | 1973[2] |
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