Comparison ledger
Applied Materials 0041-39086 ESC Part, Plasma-Therm Unaxis ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0041-39086 ESC PartApplied Materials | Unaxis ICPPlasma-Therm |
|---|---|---|
| OEM | Applied Materials | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | Wafer auto load/unload |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Plasma-Therm Unaxis ICP |
| Specifications | ||
| Configuration | — | Gas Box:[1] |
| Gas 1 | — | UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1] |
| Gas 2 | — | MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1] |
| Gas 3 | — | MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1] |
| Gas 4 | — | UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1] |
| Gas 5 | — | MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1] |
| Gas 6 | — | MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1] |
| Gas 7 | — | UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1] |
| Gas 8 | — | MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1] |
| Wafer size | — | Wafer auto load/unload[1] |
| Temperature | — | Watlow 988 Chamber Chuck Temperature Control: (20-300°C) +/- 1°C[1] |
| Generator | — | ENI ACG 6 B[1] |
| Pressure Control Range | — | 100 mTorr[1] |
| VAT Valve Control | — | PM 5[1] |
| Turbo Pump Limit Vacuum | — | 5.0 E-6 Torr[1] |
| Tool type | — | Inductively Coupled Plasma (ICP) etcher[1] |
| Wafer sizes | — | 2, 3, 4, 6, 8 inch[1] |
| Chamber | — | Wafer auto load/unload[1] |
| Chamber chuck temperature control | — | Watlow 988, 20-300°C, +/- 1°C[1] |
| RF system generator | — | ENI ACG 6 B[1] |
| Pressure gauge | — | MKS 627 vacuum gauge[1] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →