Comparison ledger
Oxford Instruments 100 ICP Fluorine, Oxford Instruments Plasmalab 100 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | Plasmalab 100 RIEOxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Oxford Instruments Plasmalab 100 |
| Cited variants | — | |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] | — |
| Cryo DRIE etch rate | up to 5 µm/min[3] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[3] | — |
| Voltage | — | 208V, 50/60Hz[4] |
| Configuration | — | With VAT PM-5 Adaptive Pressure Controller[4] |
| Wafer Size | — | 6 inch[4] |
| RF Generator | — | Advanced Energy RFX 600A, 600 W @ 13.56 MHz[2] |
| Electrode Temperature Range | — | 10°C to 80°C[2] |
| Turbo Pump | — | Alcatel ATH 400M[2] |
| Turbo Pump Controller | — | Alcatel ACT 600M[2] |
| Pressure Controller | — | VAT PM-5 Adaptive Pressure Controller[4] |
| Number of Gas Lines | — | 6 (with MFCs)[2] |
| Installed Gases | — | Ar, N2, CHF3, NF3, N2O[2] |
| Chiller | — | Thermo Neslab RTE7 Chiller and OptiTemp OTI-5WL-P3-216 Chiller[4] |
| Vacuum Pump | — | Leybold D65BCS Vacuum Pump with oil filter and exhaust filter[4] |
| Control System | — | Windows PC with user-friendly interface and blue PLC control architecture[2] |
| Platen Size | — | 330 mm platen[2] |
| Load-locked | — | Yes[1] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →